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Anomalous Nernst effect of a ferromagnetic film on a semiconductor

机译:铁磁膜对半导体的异常鼻塞效应

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摘要

Measuring the anomalous Nernst effect of magnetically ordered thin films on substrates is often hampered by the mismatch between different thermal conductivities and the unknown temperature gradient in the film. Here, we demonstrate that for ferromagnetic films deposited on a semiconducting substrate, the Nernst effect of the semiconductor can serve as an internal reference for estimating the local temperatures present in the film and substrate. The Nernst effect in semiconductors is particularly large in the temperature region above 200 K where the semiconductor shows a strong change in the charge carrier concentration. As an example, we have studied the anomalous Nernst effect of 28 nm thick ferromagnetic Mn_5Ge_3C_(0.8) films deposited on p-type Ge(111) substrates with the temperature gradient oriented either parallel or perpendicular to the film plane. From the additional contribution of the Nernst effect arising from the substrate and comparison with theory, we estimate the temperature gradient in the substrate and thin film for both configurations and determine the thermoelectric coefficients of the film.
机译:测量磁有序薄膜在基板上的异常NERNST效应通常通过不同的热导体之间的错配和薄膜中未知的温度梯度之间的不匹配而受到阻碍。这里,我们证明,对于沉积在半导体基板上的铁磁膜,半导体的NERNST效应可以用作估计膜和基板中存在的局部温度的内部参考。半导体中的NERNST效应在200k高于200K的温度区域中特别大,其中半导体表示电荷载流子浓度的强大变化。作为一个例子,我们已经研究了沉积在P型Ge(111)基板上的28nm厚的铁磁性Mn_5ge_3c_(0.8)膜的异常鼻塞效应,其温度梯度是平行的或垂直于膜平面的。从基材产生的NERNST效应的额外贡献和理论的比较,我们估计衬底和两种配置的薄膜中的温度梯度并确定膜的热电系数。

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  • 来源
    《Applied Physics Letters》 |2020年第26期|262402.1-262402.5|共5页
  • 作者单位

    Physikalisches Institut Karlsruhe Institute of Technology Wolfgang Gaede Str.. 1 76131 Karlsruhe Germany Spallation Neutron Source Science Center 523803 Dongguan People's Republic of China;

    Physikalisches Institut Karlsruhe Institute of Technology Wolfgang Gaede Str.. 1 76131 Karlsruhe Germany;

    Physikalisches Institut Karlsruhe Institute of Technology Wolfgang Gaede Str.. 1 76131 Karlsruhe Germany;

    Physikalisches Institut Karlsruhe Institute of Technology Wolfgang Gaede Str.. 1 76131 Karlsruhe Germany;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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