机译:在Si L_(2,3)的非线性XUV-光学瞬态光栅光谱谱
Paul Scherrer Inst CH-5232 Villigen Switzerland;
Paul Scherrer Inst CH-5232 Villigen Switzerland;
Paul Scherrer Inst CH-5232 Villigen Switzerland;
Paul Scherrer Inst CH-5232 Villigen Switzerland;
Paul Scherrer Inst CH-5232 Villigen Switzerland;
Polish Acad Sci Inst Nucl Phys PL-31342 Krakow Poland;
Elettra Sincrotrone Trieste SCpA SS 14 Km 163 5 Area Sci Pk I-34012 Trieste Italy;
Elettra Sincrotrone Trieste SCpA SS 14 Km 163 5 Area Sci Pk I-34012 Trieste Italy;
Ist Off Mat CNR I-34149 Basovizza TS Italy;
Elettra Sincrotrone Trieste SCpA SS 14 Km 163 5 Area Sci Pk I-34012 Trieste Italy;
Elettra Sincrotrone Trieste SCpA SS 14 Km 163 5 Area Sci Pk I-34012 Trieste Italy;
Elettra Sincrotrone Trieste SCpA SS 14 Km 163 5 Area Sci Pk I-34012 Trieste Italy;
Elettra Sincrotrone Trieste SCpA SS 14 Km 163 5 Area Sci Pk I-34012 Trieste Italy;
Elettra Sincrotrone Trieste SCpA SS 14 Km 163 5 Area Sci Pk I-34012 Trieste Italy;
IOM CNR Str Statale 14 Km 163-5 I-34149 Trieste Italy;
Univ Bern Inst Appl Phys CH-3012 Bern Switzerland;
Univ Bern Inst Appl Phys CH-3012 Bern Switzerland;
Univ Bern Inst Appl Phys CH-3012 Bern Switzerland;
Univ Bern Inst Appl Phys CH-3012 Bern Switzerland;
MIT 77 Massachusetts Ave Cambridge MA 02139 USA;
MIT 77 Massachusetts Ave Cambridge MA 02139 USA;
Paul Scherrer Inst CH-5232 Villigen Switzerland;
机译:Si L_(2,3)边缘的非线性XUV光学瞬态光栅光谱
机译:H_2S,HCl和Cl_2的L_(2,3)附近边缘光吸收光谱的多重散射X研究以及XH_n,X = Si,P,L_(2,3)附近边缘光谱的强度变化S,Cl和n = 4、3、2、1
机译:L_(2,3)-边缘x射线吸收近边缘光谱法分析固体钌-二氧化硫配合物中的光异构
机译:Si-Rich A-Sin_(x):H薄膜用于EUV光刻的预期材料:Si L_(2,3)附近的光学响应
机译:粒子悬浮液中的瞬态光栅:热非线性和气泡形成的影响。
机译:用阿秒脉冲的瞬态光栅光谱探测非线性XUV信号的产生
机译:高灵敏度瞬态红外光谱:带有外差检测红外探头的紫外/可见瞬变光栅光谱仪