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Low-frequency noise and defects in copper and ruthenium resistors

机译:低频噪声以及铜和钌电阻器中的缺陷

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摘要

1.8-MeV proton irradiation to a fluence of 10(14)/cm(2) does not significantly affect the resistance or low-frequency noise of copper or ruthenium resistors fabricated via modern microelectronic fabrication techniques used to form metal lines. The room-temperature noise of these Cu and Ru resistors is surprisingly similar to that of Cu and Pt metal lines and wires fabricated using late-1970s nanofabrication techniques; however, measurements of the temperature dependence of the noise show that the defect kinetics are quite different among the various materials. A large increase in the noise magnitude observed above 200K in Cu but not in Ru is consistent with the superior resistance to electromigration that Ru lines have shown, relative to Cu.
机译:1.8 MeV质子辐照至10(14)/ cm(2)的注量不会显着影响通过用于形成金属线的现代微电子制造技术制造的铜或钌电阻器的电阻或低频噪声。这些Cu和Ru电阻的室温噪声令人惊讶地类似于使用1970年代后期纳米加工技术制造的Cu和Pt金属线和导线的室温噪声。但是,对噪声的温度依赖性的测量表明,各种材料之间的缺陷动力学差异很大。观察到,在200K以上的Cu中,但在Ru中没有观察到较大的噪声幅度,这与Ru线相对于Cu表现出的优异的抗电迁移性相一致。

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  • 来源
    《Applied Physics Letters》 |2019年第20期|203501.1-203501.5|共5页
  • 作者单位

    Vanderbilt Univ, Dept Elect Engn & Comp Sci, Nashville, TN 37235 USA;

    Katholieke Univ Leuven, MTM, Kasteelpk Arenberg 44 Bus 2450, B-3001 Leuven, Belgium|Imec, Kapeldreef 75, B-3001 Leuven, Belgium;

    Vanderbilt Univ, Dept Elect Engn & Comp Sci, Nashville, TN 37235 USA;

    Vanderbilt Univ, Dept Elect Engn & Comp Sci, Nashville, TN 37235 USA;

    Vanderbilt Univ, Dept Elect Engn & Comp Sci, Nashville, TN 37235 USA;

    Univ Padua, Dept Informat Engn, I-35131 Padua, Italy;

    Vanderbilt Univ, Dept Elect Engn & Comp Sci, Nashville, TN 37235 USA;

    Imec, Kapeldreef 75, B-3001 Leuven, Belgium;

    Katholieke Univ Leuven, MTM, Kasteelpk Arenberg 44 Bus 2450, B-3001 Leuven, Belgium|Imec, Kapeldreef 75, B-3001 Leuven, Belgium;

    Imec, Kapeldreef 75, B-3001 Leuven, Belgium;

    Vanderbilt Univ, Dept Elect Engn & Comp Sci, Nashville, TN 37235 USA;

    Vanderbilt Univ, Dept Elect Engn & Comp Sci, Nashville, TN 37235 USA;

    Vanderbilt Univ, Dept Elect Engn & Comp Sci, Nashville, TN 37235 USA;

    Vanderbilt Univ, Dept Elect Engn & Comp Sci, Nashville, TN 37235 USA;

    Imec, Kapeldreef 75, B-3001 Leuven, Belgium;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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