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Influence of effective channel length in self-aligned coplanar amorphous-indium-gallium-zinc-oxide thin-film transistors with different annealing temperatures

机译:有效沟道长度对不同退火温度下自对准共平面非晶铟镓锌氧化锌薄膜晶体管的影响

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摘要

Electrical characteristics of self-aligned coplanar amorphous-indium-gallium-zinc-oxide (a-IGZO) thin-film transistors (TFTs) were investigated for different annealing temperatures. The field-effect mobility of the a-IGZO TFTs increased with the annealing temperature, in particular, for a small channel length. The effective channel length (L-eff) of the a-IGZO TFTs was extracted using the transmission line method. The decrease in L-eff significantly depended on the annealing temperature, due to the hydrogen diffusion into the a-IGZO channel region. The intrinsic mobility calculated from the channel resistance of the a-IGZO TFTs was in good agreement with the mobility corrected by L-eff. Published by AIP Publishing.
机译:研究了在不同退火温度下自对准共面非晶铟镓锌氧化物(a-IGZO)薄膜晶体管的电学特性。 a-IGZO TFT的场效应迁移率随退火温度的增加而增加,特别是对于较小的沟道长度而言。使用传输线方法提取a-IGZO TFT的有效沟道长度(L-eff)。由于氢扩散到a-IGZO沟道区域中,因此L-eff的降低明显取决于退火温度。由a-IGZO TFT的沟道电阻计算出的本征迁移率与通过L-eff校正的迁移率非常一致。由AIP Publishing发布。

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  • 来源
    《Applied Physics Letters》 |2018年第2期|022104.1-022104.5|共5页
  • 作者单位

    Korea Univ, Dept Appl Phys, Sejong City 30019, South Korea;

    Samsung Display Co Ltd, Display R&D Ctr, Yongin 17113, Gyeonggi Do, South Korea;

    Samsung Display Co Ltd, Display R&D Ctr, Yongin 17113, Gyeonggi Do, South Korea;

    Samsung Display Co Ltd, Display R&D Ctr, Yongin 17113, Gyeonggi Do, South Korea;

    Korea Univ, Dept Appl Phys, Sejong City 30019, South Korea;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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