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Growth and characterization of tungsten carbide nanowires by thermal annealing of sputter-deposited WCx films

机译:溅射沉积WCx薄膜的热退火法生长和表征碳化钨纳米线

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In this letter, the growth of dense W2C nanowires by a simple thermal annealing of sputter-deposited WCx films in nitrogen ambient is reported. Straight nanowires with a density of 250-260 mum(-2) and length/diameter in the range of 0.2-0.3 mum/13-15 nm were obtained from the 700degreesC-annealed samples, which exhibit good electron field emission characteristics with a typical turn-on field of about 1.7 V/mum. The self-catalytic growth of W2C nanowires is attributed to the formation of alpha-W2C phase caused by carbon depletion in the WCx films during thermal annealing. (C) 2004 American Institute of Physics.
机译:在这封信中,报道了通过在氮环境中对溅射沉积的WCx薄膜进行简单的热退火来生长致密的W2C纳米线。从700摄氏度退火的样品中获得了密度为250-260 mum(-2)且长度/直径在0.2-0.3 mum / 13-15 nm范围内的直纳米线,这些纳米线表现出良好的电子场发射特性,具有典型的导通电场约为1.7 V /μm。 W2C纳米线的自催化生长归因于在热退火过程中WCx膜中的碳耗尽引起的α-W2C相的形成。 (C)2004美国物理研究所。

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