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Mn-implanted dilute magnetic semiconductor lnP:Mn

机译:锰注入稀磁半导体lnP:Mn

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摘要

Unintentionally doped bulk InP was prepared by the liquid encapsulated Czochralski method and subsequently implanted with various doses of Mn~+. The properties of Mn~+-implanted InP:Mn were investigated by various measurements. The results of energy dispersive x-ray peaks displayed injected concentrations of Mn of 0.8% and 8.8%, respectively. The results of photoluminescence (PL) measurement showed that optical broad transitions related to Mn appeared near 1.089, 1.144, and 1.185 eV in samples with various doses of Mn~+. It was confirmed that the photoluminescence peaks near 1.089, 1.144, and 1.185 eV were Mn-correlated PL bands by the implantation of Mn. Ferromagnetic hysteresis loops measured at 10 K were observed and the temperature-dependent magnetization showed ferromagnetic behavior around 90 K, which almost agreed with the theoretical prediction (T_c~70 K).
机译:通过液体封装的切克劳斯基方法制备了无意掺杂的块状InP,随后注入了各种剂量的Mn〜+。通过各种测量研究了Mn〜+注入的InP:Mn的性能。能量色散x射线峰的结果显示,Mn的注入浓度分别为0.8%和8.8%。光致发光(PL)测量结果表明,在不同剂量的Mn〜+样品中,与Mn相关的光学宽跃迁出现在1.089、1.144和1.185 eV附近。证实了通过注入Mn,靠近1.089、1.144和1.185eV的光致发光峰是Mn相关的PL带。观察到在10 K处测得的铁磁磁滞回线,随温度变化的磁化强度显示90 K附近的铁磁行为,几乎与理论预测值(T_c〜70 K)一致。

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