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Crossover between extrinsic and intrinsic dielectric loss mechanisms in SrTiO_(3) thin films at microwave frequencies

机译:SrTiO_(3)薄膜在微波频率下非本征和本征介电损耗机制之间的交叉

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摘要

The dc bias field dependence of the dielectric loss in SrTiO_(3) thin films deposited onto MgO substrate is investigated. The experimental data obtained at different frequencies of the ac field (8 and 16 GHz) from differently processed films (as deposited and oxygen annealed) strongly suggest the occurrence of a crossover in the dominant loss mechanism. The crossover is driven by the dc bias field: at weak fields the loss is governed by an extrinsic mechanism(s) whereas, at higher fields, the contribution of an intrinsic mechanism (dc field-induced quasi-Debye loss) becomes predominant.
机译:研究了沉积在MgO衬底上的SrTiO_(3)薄膜中介电损耗的dc偏置场依赖性。从经过不同处理的薄膜(沉积和氧退火)在不同频率的交流场(8和16 GHz)下获得的实验数据强烈表明,在主要损耗机制中发生了交叉现象。交叉由直流偏置磁场驱动:在弱磁场下,损耗由外部机制控制,而在较高磁场下,内在机理(直流磁场引起的准德拜损耗)的贡献占主导地位。

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