Mapping In concentration, strain, and internal electric field in InGaN/GaN quantum well structure

摘要

Quantitative comparisons have been made of the In concentration, strain, and internal electric field present in a pseudomorphic InGaN/GaN quantum well. Z-contrast scanning transmission electron microscopy was used for mapping In concentration with atomic resolution, variations of the c-lattice parameter of the InGaN layer were measured from (0001) lattice fringes in high-resolution transmission electron micrographs, and the internal electric fields were determined by differentiating phase images obtained by electron holography. Based on these measurements, it was concluded that local fluctuations of In concentration caused inhomogeneities in the internal electric field across the quantum well. The band structure of the quantum well would thus be altered not only by quantum dot effects but also by the additional modulation of the internal electric field, leading to further broadening of the light emission.