Texture of NiGe on Ge(001) and its evolution with formation temperature

摘要

Texture of NiGe on Ge(001) and its evolution with formation temperature have been investigated. Pole figure investigation showed that NiGe formed by rapid thermal annealing of Ni(35 nm)/Ge(001) largely consists of epitaxial grains with orientation relationships: NiGe(111) x [011]//Ge(001)[110], NiGe(020)[001]//Ge(001)[100], NiGe(201)[102]//Ge(001)[110], NiGe (211)[011]//Ge(001)[110], NiGe(112)[201]//Ge(001)[110], and NiGe(210)[001]//Ge(001)[100]. For NiGe formed at 400℃, NiGe(111)[011]//Ge(001)[110], NiGe(020)[001]//Ge(001) X[100], NiGe(201)[102]//Ge(001)[110], and NiGe(211)[011]//Ge(001)[110] were found to be the preferred orientations, while NiGe formed at 600℃ was dominated by NiGe grains with NiGe(111)[011]//Ge(001)[110] orientation. The increasing dominance of the grains with NiGe(111)[011]//Ge(001)[110] orientation is attributed to the minimum lattice mismatch with this orientation.