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Fermi-level band filling and band-gap renormalization in Ga-doped ZnO

机译:Ga掺杂ZnO中的费米能级能带填充和能带隙归一化

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摘要

The fundamental optical properties of Ga-doped ZnO films grown by metalorganic chemical vapor deposition were investigated by room-temperature transmittance and photoluminescence (PL) spectroscopy. The Burstein-Moss (BM) shift of the absorption edge energy is observed at the carrier concentration up to 2.47 X 10~(19) cm~(-3). The absorption edges are fitted to a comprehensive model based on the electronic energy-band structure near critical points plus relevant discrete and continuum excitonic effects, taking account of the Fermi-level filling factor. The theoretical calculation for BM effect is in good agreement with the experimental facts, considering the nonparabolic nature of conduction-band and band-gap renormalization (BGR) effects. Meanwhile, the monotonic redshift of the near-band-gap emission detected by PL measurements has also been observed with increasing free-carrier concentration, which is attributed to the BGR effects, and can be fitted by an n~(1/3) power law with a BGR coefficient of 1.3 X 10~(-50) meV cm.
机译:通过室温透射率和光致发光(PL)光谱研究了通过金属有机化学气相沉积法生长的掺杂Ga的ZnO薄膜的基本光学性能。在载流子浓度高达2.47 X 10〜(19)cm〜(-3)时,观察到吸收边能量的Burstein-Moss(BM)移动。考虑到费米能级填充因子,基于临界点附近的电子能带结构以及相关的离散和连续激子效应,将吸收边拟合为一个综合模型。考虑到导带和带隙重归一化(BGR)效应的非抛物线性质,BM效应的理论计算与实验事实非常吻合。同时,随着自由载流子浓度的增加,还观察到通过PL测量检测到的近带隙发射的单调红移,这归因于BGR效应,并且可以通过n〜(1/3)幂拟合BGR系数为1.3 X 10〜(-50)meV cm的定律。

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