Integrated shadow mask method for patterning small molecule organic semiconductors

摘要

We have developed a simple and efficient method for patterning small molecule semiconductors for applications in the field of organic electronics. In our approach, a profile is created using a single layer of photoresist, defining the regions where the organic semiconductor is to be deposited. Subsequent deposition of a small molecule semiconductor results in a discontinuity of the semiconductor film at the photoresist edge. The resulting transistor characteristics have an off current mat is systematically below 1 pA. We demonstrate both p-type and n-type organic thin-film transistors using this method, using pentacene and copper hexadecafluorophthalocyanine (F_(16)CuPc), respectively.