首页> 外文期刊>Applied Physics Letters >Recrystallization of an amorphized epitaxial phase-change alloy: A phoenix arising from the ashes
【24h】

Recrystallization of an amorphized epitaxial phase-change alloy: A phoenix arising from the ashes

机译:非晶化外延相变合金的再结晶:灰烬产生的凤凰

获取原文
获取原文并翻译 | 示例
           

摘要

Epitaxial Ge_2Sb_2Te_5 films grown on Si(111) by molecular beam epitaxy were reversibly switched between crystalline and amorphous states over a large area using femtosecond laser pulses. The structural and spatial homogeneity of the as-grown epitaxial and laser-switched areas on the sample were investigated by synchrotron nanofocus high resolution x-ray diffraction. The investigation clearly demonstrated that the single crystalline metastable cubic phase of Ge_2Sb_2Te_5 is restored after switching. No polycrystalline features, not only on the average but even on the nanometer scale of the x-ray beam, were observed.
机译:通过飞秒激光脉冲,通过分子束外延在Si(111)上生长的外延Ge_2Sb_2Te_5薄膜在大面积区域内可逆地在晶态和非晶态之间切换。通过同步加速器纳米聚焦高分辨率x射线衍射研究了样品上生长的外延和激光开关区域的结构和空间均匀性。研究清楚地表明,切换后Ge_2Sb_2Te_5的单晶亚稳立方相得以恢复。不仅在平均水平上,甚至在X射线束的纳米级上都没有观察到多晶特征。

著录项

  • 来源
    《Applied Physics Letters》 |2012年第6期|p.061903.1-061903.3|共3页
  • 作者单位

    Paul-Drude-Institut fur Festkorperelektronik, Hausvogteiplatz 5-7,10] 17 Berlin, Germany;

    Paul-Drude-Institut fur Festkorperelektronik, Hausvogteiplatz 5-7,10] 17 Berlin, Germany;

    Paul-Drude-Institut fur Festkorperelektronik, Hausvogteiplatz 5-7,10] 17 Berlin, Germany;

    Paul-Drude-Institut fur Festkorperelektronik, Hausvogteiplatz 5-7,10] 17 Berlin, Germany;

    Paul-Drude-Institut fur Festkorperelektronik, Hausvogteiplatz 5-7,10] 17 Berlin, Germany;

    Paul-Drude-Institut fur Festkorperelektronik, Hausvogteiplatz 5-7,10] 17 Berlin, Germany;

    Paul-Drude-Institut fur Festkorperelektronik, Hausvogteiplatz 5-7,10] 17 Berlin, Germany;

    European Synchrotron Radiation Facility, 6, rue Jules Horowitz, 38043 Grenoble Cedex 09, France;

    Nanoelectronics Research Institute, AIST, Tsukuba Central 4, Higashi 1-1-1 Tsukuba, Ibaraki 305-8562, Japan;

    Nanoelectronics Research Institute, AIST, Tsukuba Central 4, Higashi 1-1-1 Tsukuba, Ibaraki 305-8562, Japan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号