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首页> 外文期刊>Applied Physics Letters >Enhanced overall efficiency of GaInN-based light-emitting diodes with reduced efficiency droop by Al-composition-graded AlGaN/GaN superlattice electron blocking layer
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Enhanced overall efficiency of GaInN-based light-emitting diodes with reduced efficiency droop by Al-composition-graded AlGaN/GaN superlattice electron blocking layer

机译:通过Al组成渐变的AlGaN / GaN超晶格电子阻挡层提高了基于GaInN的发光二极管的整体效率,并降低了效率下降

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摘要

Al_xGa_(1-x)N/GaN superlattice electron blocking layers (EBLs) with gradually decreasing Al composition toward the p-type GaN layer are introduced to GaInN-based high-power light-emitting diodes (LEDs). GaInN/GaN multiple quantum well LEDs with 5- and 9-period Al-composition-graded Al_xGa_(1-x)N/GaN EBL show comparable operating voltage, higher efficiency as well as less efficiency droop than LEDs having conventional bulk AlGaN EBL, which is attributed to the superlattice doping effect, enhanced hole injection into the active region, and reduced potential drop in the EBL by grading Al compositions. Simulation results reveal a reduction in electron leakage for the superlattice EBL, in agreement with experimental results.
机译:将Al成分朝p型GaN层逐渐减少的Al_xGa_(1-x)N / GaN超晶格电子阻挡层(EBL)引入基于GaInN的高功率发光二极管(LED)。具有5和9周期Al成分等级的Al_xGa_(1-x)N / GaN EBL的GaInN / GaN多量子阱LED与具有常规AlGaN EBL的LED相比具有可比的工作电压,更高的效率和更低的下垂率,这归因于超晶格掺杂效应,增强了向有源区的空穴注入以及通过对Al成分进行分级而降低了EBL中的电势下降。仿真结果表明,超晶格EBL的电子泄漏减少,与实验结果一致。

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  • 来源
    《Applied Physics Letters》 |2013年第6期|061104.1-061104.4|共4页
  • 作者单位

    Department of Materials Science and Engineering, Pohang University of Science and Technology (POSTECH), Pohang 790-784, South Korea;

    Department of Materials Science and Engineering, Pohang University of Science and Technology (POSTECH), Pohang 790-784, South Korea;

    Department of Materials Science and Engineering, Pohang University of Science and Technology (POSTECH), Pohang 790-784, South Korea;

    Future Chips Constellation, Department of Electrical, Computer, and Systems Engineering, Rensselaer Polytechnic Institute, Troy, New York 12180, USA;

    Future Chips Constellation, Department of Electrical, Computer, and Systems Engineering, Rensselaer Polytechnic Institute, Troy, New York 12180, USA;

    Seoul Opto-device Co., 725-5 Wonsi-dong, Danwon-gu, Ansan City, Kyunggi-do 425-851, South Korea;

    Seoul Opto-device Co., 725-5 Wonsi-dong, Danwon-gu, Ansan City, Kyunggi-do 425-851, South Korea;

    School of Semiconductor and Chemical Engineering, Semiconductor Physics Research Center, Chonbuk National University, Jeonju 561-756, South Korea;

    Department of Materials Science and Engineering, Pohang University of Science and Technology (POSTECH), Pohang 790-784, South Korea;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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