机译:铍在MgZnO的能带结构中的作用:提升价带最大值
State Key Laboratory of Silicon Materials, Cyrus Tang Center for Sensor Materials and Applications, Department of Materials Science and Engineering, Zhejiang University, Hangzhou 310027, People's Republic of China;
State Key Laboratory of Silicon Materials, Cyrus Tang Center for Sensor Materials and Applications, Department of Materials Science and Engineering, Zhejiang University, Hangzhou 310027, People's Republic of China;
State Key Laboratory of Silicon Materials, Cyrus Tang Center for Sensor Materials and Applications, Department of Materials Science and Engineering, Zhejiang University, Hangzhou 310027, People's Republic of China;
State Key Laboratory of Silicon Materials, Cyrus Tang Center for Sensor Materials and Applications, Department of Materials Science and Engineering, Zhejiang University, Hangzhou 310027, People's Republic of China;
State Key Laboratory of Silicon Materials, Cyrus Tang Center for Sensor Materials and Applications, Department of Materials Science and Engineering, Zhejiang University, Hangzhou 310027, People's Republic of China;
State Key Laboratory of Silicon Materials, Cyrus Tang Center for Sensor Materials and Applications, Department of Materials Science and Engineering, Zhejiang University, Hangzhou 310027, People's Republic of China;
State Key Laboratory of Silicon Materials, Cyrus Tang Center for Sensor Materials and Applications, Department of Materials Science and Engineering, Zhejiang University, Hangzhou 310027, People's Republic of China;
State Key Laboratory of Silicon Materials, Cyrus Tang Center for Sensor Materials and Applications, Department of Materials Science and Engineering, Zhejiang University, Hangzhou 310027, People's Republic of China;
State Key Laboratory of Silicon Materials, Cyrus Tang Center for Sensor Materials and Applications, Department of Materials Science and Engineering, Zhejiang University, Hangzhou 310027, People's Republic of China;
机译:价带最大值在各向异性1T'-ReSe_2的能带结构中的位置
机译:位于各向异性1T' -RESE2的频带结构中的价带的位置
机译:俄歇光电子重合谱研究Si(111)上的局部价电子态和超薄氮化硅膜的价带最大值:厚度和界面结构依赖性
机译:导带价带耦合对In0.28Ga0.72N / GaN量子阱能带结构的影响
机译:在薄栅氧化层MOS结构(硅碰撞电离,价带,电子)中隧穿。
机译:使用价带反交叉模型计算的InAs1-xBix和InSb1-xBix合金半导体的价带结构
机译:反向HgTe量子阱的价带能谱 乐队结构