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The role of beryllium in the band structure of MgZnO: Lifting the valence band maximum

机译:铍在MgZnO的能带结构中的作用:提升价带最大值

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We investigate the effect of Be on the valence band maximum (VBM) of MgZnO by measuring the band offsets of Mg_xZn_(1-x)O/Be_xMg_yZn_(1-x-y)O heterojunctions using X-ray photoelectron spectroscopy measurements. Mg_xZn_(1-x)O/Be_xMg_yZn_(1-x-y)O films have been grown on c-plane sapphire substrates by plasma-assisted molecular beam epitaxy. The valence band offset (ΔE_v) of Mg_(0.15)Zn_(0.85)O (E_g = 3.62 eV)/Be_(0.005)Mg_(0.19)Zn_(0.805)O (E_g = 3.73 eV) heterojunction is 0.01 eV and Be_(0.005)Mg_(0.19)Zn_(0.805)O has a lower VBM. The increased Mg composition is the main factor for the reduction of VBM. The VBM of Mg_xZn_(1-x)O is lower by 0.03 eV with the enlargement of E_g from 3.62 eV to 3.73 eV by increasing Mg composition. Considering the effect of increased Mg composition, it is concluded that the little amount of Be makes the VBM go up by 0.02 eV when the E_g of the alloy is 3.73 eV. The ΔE_v of Mg_(0.11)Zn_(0.89)O (E_g = 3.56 eV)/Be_(0.007)Mg_(0.12)Zn_(0.873)O (E_g = 3.56 eV) heterojunction is calculated to be 0.03 eV and Be_(0.007)Mg_(0.12)Zn_(0.873)O has a higher VBM than Mg_(0.11)Zn_(0.89)O, which means that a little amount Be lifts the VBM by 0.03 eV when the E_g of the alloy is 3.56 eV. The experimental measurements have offered a strong support for the theoretical research that alloying Be in Mg_xZn_(1-x)O alloys is hopeful to form a higher VBM and to enhance the p-type dopability of MgZnO.
机译:我们通过使用X射线光电子能谱测量方法测量Mg_xZn_(1-x)O / Be_xMg_yZn_(1-x-y)O异质结的能带偏移来研究Be对MgZnO的价带最大值(VBM)的影响。 Mg_xZn_(1-x)O / Be_xMg_yZn_(1-x-y)O膜已通过等离子辅助分子束外延生长在c面蓝宝石衬底上。 Mg_(0.15)Zn_(0.85)O(E_g = 3.62 eV)/ Be_(0.005)Mg_(0.19)Zn_(0.805)O(E_g = 3.73 eV)的价带偏移(ΔE_v)为0.01 eV,Be_( 0.005)Mg_(0.19)Zn_(0.805)O的VBM较低。 Mg成分增加是降低VBM的主要因素。 Mg_xZn_(1-x)O的VBM通过增加Mg组成将E_g从3.62 eV扩大到3.73 eV,降低了0.03 eV。考虑到增加Mg组成的影响,可以得出结论,当合金的E_g为3.73 eV时,少量的Be可使VBM上升0.02 eV。 Mg_(0.11)Zn_(0.89)O(E_g = 3.56 eV)/ Be_(0.007)Mg_(0.12)Zn_(0.873)O(E_g = 3.56 eV)异质结的ΔE_v计算为0.03 eV和Be_(0.007) Mg_(0.12)Zn_(0.873)O的VBM高于Mg_(0.11)Zn_(0.89)O,这意味着当合金的E_g为3.56 eV时,少量的Be可使VBM升高0.03 eV。实验测量为Mg_xZn_(1-x)O合金中的Be合金化形成较高的VBM并增强MgZnO的p型掺杂性提供了理论支持。

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  • 来源
    《Applied Physics Letters》 |2014年第12期|122112.1-122112.5|共5页
  • 作者单位

    State Key Laboratory of Silicon Materials, Cyrus Tang Center for Sensor Materials and Applications, Department of Materials Science and Engineering, Zhejiang University, Hangzhou 310027, People's Republic of China;

    State Key Laboratory of Silicon Materials, Cyrus Tang Center for Sensor Materials and Applications, Department of Materials Science and Engineering, Zhejiang University, Hangzhou 310027, People's Republic of China;

    State Key Laboratory of Silicon Materials, Cyrus Tang Center for Sensor Materials and Applications, Department of Materials Science and Engineering, Zhejiang University, Hangzhou 310027, People's Republic of China;

    State Key Laboratory of Silicon Materials, Cyrus Tang Center for Sensor Materials and Applications, Department of Materials Science and Engineering, Zhejiang University, Hangzhou 310027, People's Republic of China;

    State Key Laboratory of Silicon Materials, Cyrus Tang Center for Sensor Materials and Applications, Department of Materials Science and Engineering, Zhejiang University, Hangzhou 310027, People's Republic of China;

    State Key Laboratory of Silicon Materials, Cyrus Tang Center for Sensor Materials and Applications, Department of Materials Science and Engineering, Zhejiang University, Hangzhou 310027, People's Republic of China;

    State Key Laboratory of Silicon Materials, Cyrus Tang Center for Sensor Materials and Applications, Department of Materials Science and Engineering, Zhejiang University, Hangzhou 310027, People's Republic of China;

    State Key Laboratory of Silicon Materials, Cyrus Tang Center for Sensor Materials and Applications, Department of Materials Science and Engineering, Zhejiang University, Hangzhou 310027, People's Republic of China;

    State Key Laboratory of Silicon Materials, Cyrus Tang Center for Sensor Materials and Applications, Department of Materials Science and Engineering, Zhejiang University, Hangzhou 310027, People's Republic of China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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