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Phonon induced luminescence decay in monolayer MoS_2 on SiO_2/Si substrates

机译:声子在SiO_2 / Si衬底上单层MoS_2中的发光衰减

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摘要

Exfoliated monolayer MoS_2 films on SiO_2/Si substrates have been studied using photoluminescence (PL), Raman and reflectance contrast (RC) spectroscopies. With increase in temperature, the intensity of the two dominant PL spectral features A and D, attributed to A exciton/trion and to defects, seemingly decay in an activated fashion with an energy ~50meV, which is close to the energies of E__(2g)~1 and A_(1g) phonons. Comparison of absorption spectrum derived from RC with circular polarization resolved PL spectrum suggests that both D and A emissions are associated with bound excitons, the A emission involving relatively weakly localized ones. The PL decay behaviour is explained using a phenomenological model where non-radiative loss of excitons is determined by the number of excited phonon modes. This corroborates the recent finding of strong A exciton and A_(1g) phonon coupling in monolayer MoS_2.
机译:使用光致发光(PL),拉曼和反射比(RC)光谱学研究了SiO_2 / Si基底上的单层剥离MoS_2薄膜。随着温度的升高,归因于A激子/ tri子和缺陷的两个主要PL光谱特征A和D的强度似乎以激活的方式衰减,能量为〜50meV,接近E __(2g )〜1和A_(1g)声子将RC产生的吸收光谱与圆极化分辨的PL光谱进行比较,结果表明D和A发射均与束缚激子相关,A发射涉及相对较弱的局部激子。使用现象学模型解释了PL衰变行为,其中激子的非辐射损失由激发的声子模数决定。这证实了最近在单层MoS_2中发现强A激子和A_(1g)声子耦合的发现。

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  • 来源
    《Applied Physics Letters》 |2015年第24期|242103.1-242103.4|共4页
  • 作者

    Mihit Saigal; Sandip Ghosh;

  • 作者单位

    Department of Condensed Matter Physics and Materials Science, Tata Institute of Fundamental Research, Mumbai 400005, India;

    Department of Condensed Matter Physics and Materials Science, Tata Institute of Fundamental Research, Mumbai 400005, India;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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