首页> 外文期刊>Applied Physics Letters >Electronic and magnetic phenomena at the interface of LaAlO_3 and Ru doped SrTiO_3
【24h】

Electronic and magnetic phenomena at the interface of LaAlO_3 and Ru doped SrTiO_3

机译:LaAlO_3和Ru掺杂SrTiO_3界面的电子和磁性现象

获取原文
获取原文并翻译 | 示例
           

摘要

We have investigated the effect of Ru doping the SrTiO_3 (STO) side of the LaAKVSTO (LAO/STO) interface. The metallic behavior at the interface is remarkably robust to defects and disorder. Despite spin moment contribution from Ru ions, we see no evidence of magnetic ordering at the Ti L_(3,2) edge in either doped or undoped interfaces using X-ray magnetic circular dichroism. Magnetotransport measurements also do not show any evidence of magnetic scattering beyond that observed in undoped LAO/STO interfaces. Insertion of more than 7 unit cells of Ru doped STO at the interface suppresses metallic conductivity with a surprisingly sharp metal insulator transition. A similar metal-insulator transition is observed when a homoepitaxial STO film is grown on the single crystal substrate before LAO deposition. Together, our results indicate that ferromagnetism is not intrinsic to the interface, magnetic Ru dopants are not significant sources of scattering, and that cation vacancy formation alone cannot explain the insulating behavior observed in thick homoepitaxial LAO/STO/STO bilayers.
机译:我们已经研究了Ru掺杂LaAKVSTO(LAO / STO)界面的SrTiO_3(STO)一侧的影响。界面处的金属行为对缺陷和无序性非常稳定。尽管Ru离子产生了自旋矩,但我们没有发现使用X射线磁性圆二色性在掺杂或未掺杂界面中Ti L_(3,2)边缘处的磁性有序的证据。除未掺杂的LAO / STO界面中观察到的磁散射外,磁传输测量也未显示任何磁散射迹象。在界面处插入7个以上的Ru掺杂的STO晶胞会抑制金属导电性,并具有惊人的尖锐的金属绝缘体过渡。当在LAO沉积之前在单晶衬底上生长同质外延STO膜时,观察到类似的金属-绝缘体转变。在一起,我们的结果表明,铁磁性不是界面固有的,磁性Ru掺杂剂不​​是重要的散射源,而且仅阳离子空位的形成不能解释在厚的外延LAO / STO / STO双层中观察到的绝缘行为。

著录项

  • 来源
    《Applied Physics Letters》 |2015年第24期|241603.1-241603.5|共5页
  • 作者单位

    Department of Materials Science and Engineering and Geballe Laboratory for Advanced Materials, Stanford University, Stanford, California 94305, USA;

    Department of Applied Physics and Geballe Laboratory for Advanced Materials, Stanford University, Stanford, California 94305, USA;

    Advanced Light Source, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA;

    Advanced Light Source, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA;

    Advanced Light Source, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA;

    Department of Applied Physics and Geballe Laboratory for Advanced Materials, Stanford University, Stanford, California 94305, USA;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号