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首页> 外文期刊>Applied Physics Letters >Low-temperature dynamics of ferroelectric domains in PbZr_(0.3)Ti_(0.7)O_3 epitaxial thin films studied by piezoresponse force microscopy
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Low-temperature dynamics of ferroelectric domains in PbZr_(0.3)Ti_(0.7)O_3 epitaxial thin films studied by piezoresponse force microscopy

机译:压电响应力显微镜研究PbZr_(0.3)Ti_(0.7)O_3外延薄膜中铁电畴的低温动力学

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摘要

Dynamics of domain boundaries is expected to change drastically at low absolute temperatures but direct experimental information for this temperature range is still lacking. To clarify the mechanism of low-temperature domain dynamics, we studied the growth of ferroelectric domains in the temperature range 4.2-295 K using the out-of-plane piezoresponse mode of a cryogenic atomic force microscope (AFM). Nanoscale 180° domains were created in epitaxial PbZr_(0.3)Ti_(0.7)O_3 films by applying short voltage pulses between the conductive AFM tip brought into contact with the bare film surface and the bottom LaSr_(0.7)Mn_(0.3)O_3 electrode. A quantitative analysis of acquired piezoresponse images enabled us to determine the in-plane domain size as a function of the writing voltage and pulse duration. It is found that at all studied temperatures the dependence of this size on the pulse duration can be fitted by a logarithmic function, which indicates that the domain-wall velocity exponentially depends on the driving electric field. The theoretical analysis of experimental data shows that the observed low-temperature domain dynamics is consistent with the creep of domain boundaries occurring in the presence of defects and structural nanoheterogeneities.
机译:预期在绝对温度较低的情况下,畴边界的动力学会发生巨大变化,但仍缺乏该温度范围的直接实验信息。为了阐明低温域动力学的机理,我们使用低温原子力显微镜(AFM)的平面外压电响应模式研究了4.2-295 K温度范围内铁电域的生长。通过在与裸膜表面接触的导电AFM尖端和底部LaSr_(0.7)Mn_(0.3)O_3电极之间施加短电压脉冲,在外延PbZr_(0.3)Ti_(0.7)O_3薄膜中创建了纳米级180°畴。对获得的压电响应图像的定量分析使我们能够根据写入电压和脉冲持续时间确定平面内域大小。发现在所有研究的温度下,该大小对脉冲持续时间的依赖性都可以通过对数函数拟合,这表明畴壁速度呈指数依赖于驱动电场。实验数据的理论分析表明,观察到的低温域动力学与存在缺陷和结构纳米异质性时发生的域边界蠕变一致。

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  • 来源
    《Applied Physics Letters》 |2015年第15期|152904.1-152904.5|共5页
  • 作者单位

    Peter the Great St. Petersburg Polytechnic University, 195251 St. Petersburg, Russia;

    Peter the Great St. Petersburg Polytechnic University, 195251 St. Petersburg, Russia;

    Nanoelektronik, Technische Fakultaet, Christian-Albrechts-Universitaet zu Kiel, D-24143 Kiel, Germany;

    Nanoelektronik, Technische Fakultaet, Christian-Albrechts-Universitaet zu Kiel, D-24143 Kiel, Germany;

    Nanoelektronik, Technische Fakultaet, Christian-Albrechts-Universitaet zu Kiel, D-24143 Kiel, Germany;

    Peter the Great St. Petersburg Polytechnic University, 195251 St. Petersburg, Russia;

    Peter the Great St. Petersburg Polytechnic University, 195251 St. Petersburg, Russia;

    Peter the Great St. Petersburg Polytechnic University, 195251 St. Petersburg, Russia,Ioffe Institute, 194021 St. Petersburg, Russia;

    Peter the Great St. Petersburg Polytechnic University, 195251 St. Petersburg, Russia,Ioffe Institute, 194021 St. Petersburg, Russia;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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