机译:钽底层对Ni_(81)Fe_(19)薄膜中磁化动力学的影响
Department of Electrical and Computer Engineering and NUSNNI, National University of Singapore, Singapore 117576, Singapore;
Department of Electrical and Computer Engineering and NUSNNI, National University of Singapore, Singapore 117576, Singapore;
Department of Electrical and Computer Engineering and NUSNNI, National University of Singapore, Singapore 117576, Singapore;
National Institute for Materials Science, Tsukuba 305-0047, Japan;
Department of Electrical and Computer Engineering and NUSNNI, National University of Singapore, Singapore 117576, Singapore;
机译:双层Co_(90)Fe_(10)/ Ni_(81)Fe_(19),Ni_(81)Fe_(19)/ Co_(90)Fe_(10)和单层Ni_(81)Fe_(19)的FMR研究电影
机译:层间交换耦合Ni_(81)Fe_(19)/ Ru / Ni_(81)Fe_(19)薄膜动力学特性的频域和时域研究
机译:离子诱导的Ruderman-Kittel-Kasuya-Yoshida耦合Ni_(81)Fe_(19)/ Ru / Co_(90)Fe_(10)薄膜的磁畴和磁化反转
机译:离子诱导的磁图案磁性畴和磁化逆转磁性图案化Ruderman-Kittei-Kasuya-Yoshida偶联Ni_(81)Fe_(19)/ Ru / Co_(90)Fe_(10)膜
机译:聚合物底层对物理气相沉积钛和氮化钛薄膜的影响。
机译:界面修饰的Ni81Fe19 / Pt双层薄膜微结构的可调谐磁化动力学
机译:界面改性的Ni81Fe19 / Pt双层薄膜微结构中的可调磁化动力学。