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Solution-processed PCDTBT capped low-voltage InGaZnO_x thin film phototransistors for visible-light detection

机译:溶液处理的PCDTBT封盖的低压InGaZnO_x薄膜光电晶体管,用于可见光检测

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摘要

The effects of visible-light detection based on solution processed poly[N-9"-hepta-decanyl-2,7-carbazole-alt-5,5-(4',7'-di-2-thienyl-2',1',3'benzothiadiazole) (PCDTBT) capped InGaZnO_x (IGZO) phototransistors with Al_2O_x serving as gate dielectric are investigated in this paper. The high-k dielectric is used to lower the device operating voltage down to 2 V. Photons emitted from laser sources with the wavelengths (λ) of 532 nm and 635 nm are absorbed through the layer of PCDTBT to generate electron-hole-pairs (EHPs). After the separation of EHPs, electrons are injected into IGZO layer through the p-n junction formed between the IGZO (n-type semiconductor) and the PCDTBT (p-type semiconductor). The photo-generated carriers boost the drain current of the transistors as well as bring about the negative threshold voltage shift. Significant enhanced detection performance is achieved under the laser wavelength of 532 nm. The highest photorespon-sivity reaches up to 20A/W, while the photoresponse rise time comes to 10 ms and the fall time comes to approximate 76 ms, which is much faster than trap assisted IGZO visible light detection. The fabricated phototransistors favor the application of visible-light detectors and/or optical switches.
机译:基于溶液处理的聚[N-9“-庚-癸基-2,7-咔唑-alt-5,5-(4',7'-di-2-thienyl-2',本文研究了以Al_2O_x作为栅极电介质的1',3'苯并噻二唑(PCDTBT)封盖的InGaZnO_x(IGZO)光电晶体管,使用高k电介质将器件的工作电压降低至2V。波长(λ)分别为532 nm和635 nm的源被PCDTBT层吸收,从而生成电子空穴对(EHP),在EHP分离后,电子通过形成在两个电子之间的pn结注入IGZO层。 IGZO(n型半导体)和PCDTBT(p型半导体)。光生载流子提高了晶体管的漏极电流并带来了负阈值电压漂移,在激光波长下实现了显着的检测性能532 nm。最高的光响应度达到20A / W,而光响应响应上升时间达到10毫秒,下降时间达到约76毫秒,这比陷阱辅助IGZO可见光检测要快得多。所制造的光电晶体管有利于可见光检测器和/或光学开关的应用。

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  • 来源
    《Applied Physics Letters》 |2015年第24期|242102.1-242102.5|共5页
  • 作者单位

    Department of Electronic Engineering and Materials Science and Technology Research Center, The Chinese University of Hong Kong, Shatin, N.T., Hong Kong, People's Republic of China;

    Department of Electronic Engineering and Materials Science and Technology Research Center, The Chinese University of Hong Kong, Shatin, N.T., Hong Kong, People's Republic of China;

    Department of Electronic Engineering and Materials Science and Technology Research Center, The Chinese University of Hong Kong, Shatin, N.T., Hong Kong, People's Republic of China;

    Department of Electronic Engineering and Materials Science and Technology Research Center, The Chinese University of Hong Kong, Shatin, N.T., Hong Kong, People's Republic of China;

    Department of Electronic Engineering and Materials Science and Technology Research Center, The Chinese University of Hong Kong, Shatin, N.T., Hong Kong, People's Republic of China;

    Department of Electronic Engineering and Materials Science and Technology Research Center, The Chinese University of Hong Kong, Shatin, N.T., Hong Kong, People's Republic of China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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