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Proton irradiation effects on deep level states in Mg-doped p-type GaN grown by ammonia-based molecular beam epitaxy

机译:质子辐照对氨基分子束外延生长的Mg掺杂p型GaN中深能级状态的影响

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摘要

The impact of proton irradiation on the deep level states throughout the Mg-doped p-type GaN bandgap is investigated using deep level transient and optical spectroscopies. Exposure to 1.8 MeV protons of 1 × 10~(13) cm~(-2) and 3 × 10~(13) cm~(-2) fluences not only introduces a trap with an E_V+ 1.02 eV activation energy but also brings monotonic increases in concentration for as-grown deep states at E_V + 0.48 eV, E_V + 2.42 eV, E_V + 3.00 eV, and E_V + 3.28 eV. The non-uniform sensitivities for individual states suggest different physical sources and/or defect generation mechanisms. Comparing with prior theoretical calculations reveals that several traps are consistent with associations to nitrogen vacancy, nitrogen interstitial, and gallium vacancy origins, and thus are likely generated through displacing nitrogen and gallium atoms from the crystal lattice in proton irradiation environment.
机译:使用深能级瞬态和光谱学研究了质子辐照对整个Mg掺杂的p型GaN带隙中深能级状态的影响。暴露于1×10〜(13)cm〜(-2)和3×10〜(13)cm〜(-2)能量通量的1.8 MeV质子中,不仅引入了具有E_V + 1.02 eV活化能的陷阱,而且还带来了单调性在E_V + 0.48 eV,E_V + 2.42 eV,E_V + 3.00 eV和E_V + 3.28 eV时,深层状态的浓度增加。各个状态的非均匀灵敏度表明存在不同的物理来源和/或缺陷生成机制。与先前的理论计算比较发现,多个陷阱与氮空位,氮间隙和镓空位起源相关联,因此很可能是通过在质子辐照环境中从晶格中置换氮和镓原子而产生的。

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  • 来源
    《Applied Physics Letters》 |2015年第2期|022104.1-022104.5|共5页
  • 作者单位

    Department of Electrical and Computer Engineering, The Ohio State University, Columbus, Ohio 43210, USA;

    Department of Electrical and Computer Engineering, The Ohio State University, Columbus, Ohio 43210, USA;

    Department of Materials, University of California, Santa Barbara, California 93106-5050, USA;

    Department of Electrical Engineering and Computer Science, Vanderbilt University, Nashville,Tennessee 37235, USA;

    Department of Electrical Engineering and Computer Science, Vanderbilt University, Nashville,Tennessee 37235, USA;

    Department of Electrical Engineering and Computer Science, Vanderbilt University, Nashville,Tennessee 37235, USA;

    Department of Electrical Engineering and Computer Science, Vanderbilt University, Nashville,Tennessee 37235, USA;

    Department of Materials, University of California, Santa Barbara, California 93106-5050, USA;

    Department of Electrical and Computer Engineering, The Ohio State University, Columbus, Ohio 43210, USA;

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  • 正文语种 eng
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