机译:出版者的注释:“ HF蚀刻的Si_3N_4表面的形态和化学终止”物理来吧105,261603(2014)]
Department of Materials Science and Engineering, University of Texas at Dallas, Richardson, Texas 75080,USA;
Department of Materials Science and Engineering, University of Texas at Dallas, Richardson, Texas 75080,USA;
Department of Materials Science and Engineering, University of Texas at Dallas, Richardson, Texas 75080,USA;
Department of Materials Science and Engineering, University of Texas at Dallas, Richardson, Texas 75080,USA;
Department of Materials Science and Engineering, University of Texas at Dallas, Richardson, Texas 75080,USA;
Department of Materials Science and Engineering, University of Texas at Dallas, Richardson, Texas 75080,USA;
Components Research, Intel Corporation, Hillsboro, Oregon 97124, USA;
Components Research, Intel Corporation, Hillsboro, Oregon 97124, USA;
Department of Materials Science and Engineering, University of Texas at Dallas, Richardson, Texas 75080,USA;
机译:发行人注:“氢-氮混合等离子体对4H-SiC表面进行化学和电子钝化” [应用物理来吧104,202101(2014)]
机译:出版者的注释:“化学衍生的少量MoS2和WS2纳米片的温度依赖性拉曼光谱” [Appl。物理来吧104,081911(2014)]
机译:出版者的注释:“倾斜沉积的Co / Si“ 111…”薄膜的表面形貌和磁各向异性”†Appl。物理来吧97,022507„ 2010…‡
机译:使用微波等离子体辅助化学气相沉积的多晶金刚石涂层Si_3N_4的原子力显微镜的表面粗糙度和形态分析
机译:具有理想氢终止作用的化学蚀刻新表面清洁技术:silcon(111)和硅(100)表面的表面化学和形态。
机译:回应关于一种利用聚合物测量细胞粘附力的方法的评论微型悬臂梁 应用物理来吧104236103(2014)
机译:出版商注:“表面形态和倾斜沉积的CO / Si(111)薄膜的磁各向异性”Appl。物理。吧。 97,022507(2010)