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Spin transport in nanoscale Si-based spin-valve devices

机译:纳米级硅基自旋阀装置中的自旋传输

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摘要

We investigated the spin transport in nano-scale silicon (Si)-based spin-valve devices with Fe electrodes, MgO/Ge tunnel barriers, and a 20nm-long Si channel. We observed a clear spin-valve effect when a magnetic field was applied in the film plane along and perpendicular to the Si channel transport direction. Systematic investigations of the bias voltage dependence, temperature dependence, and magnetic-field direction dependence of the magnetoresistance indicate that the observed spin-valve effect is governed by the spin transport through the nano-scale Si channel. The spin-valve effect remains observable up to 200 K. For the device with MgO/Ge tunnel barriers, with a bias voltage of 1.7 V at 50 K, the spin-dependent output voltage is 13 mV, which is among the highest values reported so far.
机译:我们研究了具有Fe电极,MgO / Ge隧道势垒和20nm长的Si沟道的纳米级基于硅(Si)的自旋阀器件中的自旋输运。当在膜平面中沿着并垂直于Si沟道传输方向施加磁场时,我们观察到了明显的自旋阀效应。对磁阻的偏置电压依赖性,温度依赖性和磁场方向依赖性的系统研究表明,观察到的自旋阀效应受通过纳米级Si通道的自旋输运的控制。自旋阀效应直到200 K仍可观察到。对于具有MgO / Ge隧道势垒的器件,在50 K下具有1.7 V的偏置电压,自旋相关的输出电压为13 mV,这是报告的最高值之​​一至今。

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  • 来源
    《Applied Physics Letters》 |2016年第23期|232402.1-232402.5|共5页
  • 作者单位

    Department of Electrical and Electronic Engineering, Tokyo Institute of Technology, 2-12-1 Ookayama, Meguro, Tokyo 152-0033, Japan;

    Department of Electrical Engineering and Information Systems, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656, Japan,Center for Spintronics Research Network, Graduate School of Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656, Japan;

    Department of Electrical and Electronic Engineering, Tokyo Institute of Technology, 2-12-1 Ookayama, Meguro, Tokyo 152-0033, Japan,Center for Spintronics Research Network, Graduate School of Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656, Japan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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