首页> 外文期刊>Applied Physics Letters >Light-induced performance increase of silicon heterojunction solar cells
【24h】

Light-induced performance increase of silicon heterojunction solar cells

机译:硅异质结太阳能电池的光诱导性能增强

获取原文
获取原文并翻译 | 示例
       

摘要

Silicon heterojunction solar cells consist of crystalline silicon (c-Si) wafers coated with doped/ intrinsic hydrogenated amorphous silicon (a-Si:H) bilayers for passivating-contact formation. Here, we unambiguously demonstrate that carrier injection either due to light soaking or (dark) forward-voltage bias increases the open circuit voltage and fill factor of finished cells, leading to a conversion efficiency gain of up to 0.3% absolute. This phenomenon contrasts markedly with the light-induced degradation known for thin-film a-Si:H solar cells. We associate our performance gain with an increase in surface passivation, which we find is specific to doped a-Si:H/c-Si structures. Our experiments suggest that this improvement originates from a reduced density of recombination-active interface states. To understand the time dependence of the observed phenomena, a kinetic model is presented.
机译:硅异质结太阳能电池由涂有掺杂/本征氢化非晶硅(a-Si:H)双层的晶体硅(c-Si)晶片组成,用于钝化接触形成。在此,我们明确地表明,由于光浸泡或(黑暗)正向偏压导致的载流子注入会增加成品电池的开路电压和填充系数,从而导致转换效率绝对值提高0.3%。这种现象与薄膜a-Si:H太阳能电池已知的光诱导降解形成鲜明对比。我们将性能的提高与表面钝化的增加联系在一起,发现钝化的增加特定于掺杂的a-Si:H / c-Si结构。我们的实验表明,这种改进源自重组活性界面态密度的降低。为了了解观察到的现象的时间依赖性,提出了一个动力学模型。

著录项

  • 来源
    《Applied Physics Letters》 |2016年第15期|153503.1-153503.5|共5页
  • 作者单位

    Ecole Polytechnique Federate de Lausanne (EPFL), Institute of Microengineering (IMT), Photovoltaics and Thin Film Electronics Laboratory, Rue de la Maladiere 71b, CH-2002 Neuchatel, Switzerland ,Choshu Industry Co., Ltd., 3740, Shin-yamanoi, Sanyo Onoda, Yamaguchi 757-8511, Japan ,Department of Materials Science and Engineering, Yamaguchi University, 2-16-1 Tokiwadai, Ube, Yamaguchi 755-8611, Japan;

    King Abdullah University of Science and Technology (KAUST), KAUST Solar Center (KSC), Thuwal, 23955-6900, Saudi Arabia;

    CSEM PV-Center, Jaquet-Droz 1, CH-2002 Neuchatel, Switzerland;

    CSEM PV-Center, Jaquet-Droz 1, CH-2002 Neuchatel, Switzerland;

    CSEM PV-Center, Jaquet-Droz 1, CH-2002 Neuchatel, Switzerland;

    CSEM PV-Center, Jaquet-Droz 1, CH-2002 Neuchatel, Switzerland;

    CSEM PV-Center, Jaquet-Droz 1, CH-2002 Neuchatel, Switzerland;

    Choshu Industry Co., Ltd., 3740, Shin-yamanoi, Sanyo Onoda, Yamaguchi 757-8511, Japan;

    Ecole Polytechnique Federate de Lausanne (EPFL), Institute of Microengineering (IMT), Photovoltaics and Thin Film Electronics Laboratory, Rue de la Maladiere 71b, CH-2002 Neuchatel, Switzerland ,CSEM PV-Center, Jaquet-Droz 1, CH-2002 Neuchatel, Switzerland;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号