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机译:任意晶体取向的单晶p型3C-SiC的基本压电霍尔系数
Queensland Micro- and Nanotechnology Centre, Griffith University, Queensland 4111, Australia;
Queensland Micro- and Nanotechnology Centre, Griffith University, Queensland 4111, Australia,School of Engineering, Griffith University, Queensland 4222, Australia;
Queensland Micro- and Nanotechnology Centre, Griffith University, Queensland 4111, Australia;
Queensland Micro- and Nanotechnology Centre, Griffith University, Queensland 4111, Australia;
Queensland Micro- and Nanotechnology Centre, Griffith University, Queensland 4111, Australia,School of Engineering, Griffith University, Queensland 4222, Australia;
机译:低载流子浓度的单晶n型3C-SiC(100)的压电霍尔效应和基本压电霍尔系数
机译:p型单晶3C-SiC的基本压阻系数
机译:用低压化学气相沉积种植的单晶P型3C-SiC(100)薄膜的压电厅效果
机译:N-Silicon的压电厅效应,用于任意晶体取向
机译:晶体学取向对单晶超精密金刚石车削中材料行为的影响。
机译:001和011极化(1-x)Pb(Mg1 ∕ 3Nb2 ∕ 3)O3-xPbTiO3单晶制成的任意长宽比谐振器的机电耦合系数...
机译:具有低载体浓度的单晶N型3C-SiC(100)的压电厅效应和基本压电厅系数