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Side-illuminated tip-enhanced Raman study of edge phonon in graphene at the electrical breakdown limit

机译:电击穿极限条件下侧照尖端增强石墨烯中边缘声子的拉曼研究

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摘要

Nanoscale integration of graphene into a circuit requires a stable performance under high current density. However, the effects of the current density that approach the electronic breakdown limit of graphene are not well understood. We explored the effects of a high current density, close to the electronic breakdown limit of 10A/cm(~3.0 × 10~8A/cm~2), on graphene, using tip-enhanced Raman scattering. The results showed that the high current density induces Raman bands at 1456 and 1530 cm~(-1), which were assigned to edge-phonon modes originating from zigzag and armchair edges. This led us to conclude that C-C bonds are cleaved due to the high current density, leaving edge structures behind, which were detected through the observation of localized phonons.
机译:将石墨烯纳米级集成到电路中需要在高电流密度下具有稳定的性能。然而,对于石墨烯的电子击穿极限的电流密度的影响尚不清楚。我们使用尖端增强拉曼散射研究了高电流密度对石墨烯的影响,该电流密度接近10A / cm(〜3.0×10〜8A / cm〜2)的电子击穿极限。结果表明,高电流密度在1456和1530 cm〜(-1)处感应出拉曼能带,这些拉曼能带被分配为源自之字形和扶手椅边缘的边缘声子模。这导致我们得出结论,由于高电流密度,C-C键断裂,留下边缘结构,这是通过观察局部声子来检测的。

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  • 来源
    《Applied Physics Letters》 |2016年第16期|163110.1-163110.4|共4页
  • 作者单位

    Scientific and Semiconducting Instruments R&D Department Optical Analysis Team, HORIBA Ltd., 2 Kisshouin Miyanohigashi-machi, Kyoto 601-8510, Japan;

    School of Science and Technology, Kwansei Gakuin University, 2-1 Gakuen Sanda, Hyogo 669-1337, Japan;

    Department of Physics, Ewha Womans University, Daehyeon-dong, Seodaemun-gu, Seoul 120-750, Korea;

    Department of Materials Science and Engineering, Yonsei University, 50 Yonsei, Seodaemun, Seoul 120-749, Korea;

    Department of Materials Science and Engineering, Yonsei University, 50 Yonsei, Seodaemun, Seoul 120-749, Korea;

    Institute of Industrial Science, The University of Tokyo, 4-6-1 Komaba Meguro-ku, Tokyo 153-8505, Japan;

    Scientific and Semiconducting Instruments R&D Department Optical Analysis Team, HORIBA Ltd., 2 Kisshouin Miyanohigashi-machi, Kyoto 601-8510, Japan;

    School of Science and Technology, Kwansei Gakuin University, 2-1 Gakuen Sanda, Hyogo 669-1337, Japan;

    Scientific and Semiconducting Instruments R&D Department Optical Analysis Team, HORIBA Ltd., 2 Kisshouin Miyanohigashi-machi, Kyoto 601-8510, Japan;

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  • 正文语种 eng
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