机译:电击穿极限条件下侧照尖端增强石墨烯中边缘声子的拉曼研究
Scientific and Semiconducting Instruments R&D Department Optical Analysis Team, HORIBA Ltd., 2 Kisshouin Miyanohigashi-machi, Kyoto 601-8510, Japan;
School of Science and Technology, Kwansei Gakuin University, 2-1 Gakuen Sanda, Hyogo 669-1337, Japan;
Department of Physics, Ewha Womans University, Daehyeon-dong, Seodaemun-gu, Seoul 120-750, Korea;
Department of Materials Science and Engineering, Yonsei University, 50 Yonsei, Seodaemun, Seoul 120-749, Korea;
Department of Materials Science and Engineering, Yonsei University, 50 Yonsei, Seodaemun, Seoul 120-749, Korea;
Institute of Industrial Science, The University of Tokyo, 4-6-1 Komaba Meguro-ku, Tokyo 153-8505, Japan;
Scientific and Semiconducting Instruments R&D Department Optical Analysis Team, HORIBA Ltd., 2 Kisshouin Miyanohigashi-machi, Kyoto 601-8510, Japan;
School of Science and Technology, Kwansei Gakuin University, 2-1 Gakuen Sanda, Hyogo 669-1337, Japan;
Scientific and Semiconducting Instruments R&D Department Optical Analysis Team, HORIBA Ltd., 2 Kisshouin Miyanohigashi-machi, Kyoto 601-8510, Japan;
机译:使用尖端增强拉曼光谱法可视化石墨烯边缘
机译:尖端增强拉曼散射展示了光栅耦合的远场拉曼选择规则的分解
机译:通过表面和干涉共增强拉曼光谱观察到的单层和多层石墨烯纳米带的边缘声子态
机译:外延石墨烯和石墨烯微岛上纳米结构的尖端增强拉曼光谱
机译:拉曼和瑞利散射研究半导体纳米线的电和声子特性。
机译:层状石墨烯和h-BN薄片中拉曼活性平面E2g声子的温度依赖性
机译:使用尖端增强拉曼光谱可视化石墨烯边缘