首页> 外文期刊>Applied Physics Letters >Microscopic origin of read current noise in TaO_x-based resistive switching memory by ultra-low temperature measurement
【24h】

Microscopic origin of read current noise in TaO_x-based resistive switching memory by ultra-low temperature measurement

机译:基于TaO_x的电阻式开关存储器中超低温度测量的读取电流噪声的微观原因

获取原文
获取原文并翻译 | 示例
       

摘要

TaO_x-based resistive random access memory (RRAM) attracts considerable attention for the development of next generation nonvolatile memories. However, read current noise in RRAM is one of the critical concerns for storage application, and its microscopic origin is still under debate. In this work, the read current noise in TaO_x-based RRAM was studied thoroughly. Based on a noise power spectral density analysis at room temperature and at ultra-low temperature of 25 K, discrete random telegraph noise (RTN) and continuous average current fluctuation (ACF) are identified and decoupled from the total read current noise in TaO_x RRAM devices. A statistical comparison of noise amplitude further reveals that ACF depends strongly on the temperature, whereas RTN is independent of the temperature. Measurement results combined with conduction mechanism analysis show that RTN in TaO_x RRAM devices arises from electron trapping/detrapping process in the hopping conduction, and ACF is originated from the thermal activation of conduction centers that form the percolation network. At last, a unified model in the framework of hopping conduction is proposed to explain the underlying mechanism of both RTN and ACF noise, which can provide meaningful guidelines for designing noise-immune RRAM devices.
机译:基于TaO_x的电阻式随机存取存储器(RRAM)在下一代非易失性存储器的开发中引起了极大的关注。但是,RRAM中的读取电流噪声是存储应用的关键问题之一,其微观起源仍在争论中。在这项工作中,对基于TaO_x的RRAM中的读取电流噪声进行了深入研究。基于室温和25 K的超低温下的噪声功率谱密度分析,可以识别离散随机电报噪声(RTN)和连续平均电流波动(ACF)并将其与TaO_x RRAM器件中的总读取电流噪声解耦。噪声幅度的统计比较进一步表明,ACF强烈依赖于温度,而RTN与温度无关。测量结果与传导机理分析相结合,表明TaO_x RRAM器件中的RTN来源于跳跃传导中的电子俘获/去俘获过程,而ACF源自形成渗流网络的传导中心的热活化。最后,在跳频传导的框架下提出了一个统一的模型来解释RTN和ACF噪声的潜在机制,这可以为设计抗噪声RRAM器件提供有意义的指导。

著录项

  • 来源
    《Applied Physics Letters》 |2016年第15期|153504.1-153504.5|共5页
  • 作者单位

    Institute of Microelectronics, Peking University, Beijing 100871, China;

    Institute of Microelectronics, Peking University, Beijing 100871, China;

    Institute of Microelectronics, Peking University, Beijing 100871, China;

    Institute of Microelectronics, Peking University, Beijing 100871, China;

    Institute of Microelectronics, Peking University, Beijing 100871, China;

    Institute of Microelectronics, Peking University, Beijing 100871, China;

    Institute of Microelectronics, Peking University, Beijing 100871, China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号