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Demonstration of high mobility and quantum transport in modulation-doped β-(Al_xGa_(1-x))2O_3/Ga_2O_3heterostructures

机译:演示了调制掺杂的β-(Al_xGa_(1-x))2O_3 / Ga_2O_3异质结构中的高迁移率和量子输运

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摘要

In this work, we demonstrate a high mobility two-dimensional electron gas (2DEG) formed at the beta-(AlxGa1-x)(2)O-3/Ga2O3 interface through modulation doping. Shubnikov-de Haas (SdH) oscillations were observed in the modulation-doped beta-(AlxGa1-x)(2)O-3/Ga2O3 structure, indicating a high-quality electron channel formed at the heterojunction interface. The formation of the 2DEG channel was further confirmed by the weak temperature dependence of the carrier density, and the peak low temperature mobility was found to be 2790 cm(2)/Vs, which is significantly higher than that achieved in bulk-doped Beta-phase Gallium Oxide (beta-Ga2O3). The observed SdH oscillations allowed for the extraction of the electron effective mass in the (010) plane to be 0.313 +/- 0.015 m(0) and the quantum scattering time to be 0.33 ps at 3.5K. The demonstrated modulation-doped beta-(AlxGa1-x)(2)O-3/Ga2O3 structure lays the foundation for future exploration of quantum physical phenomena and semiconductor device technologies based on the beta-Ga2O3 material system. Published by AIP Publishing.
机译:在这项工作中,我们演示了通过调制掺杂在β-(AlxGa1-x)(2)O-3 / Ga2O3界面形成的高迁移率二维电子气(2DEG)。 Shubnikov-de Haas(SdH)振荡在调制掺杂的β-(AlxGa1-x)(2)O-3 / Ga2O3结构中观察到,表明在异质结界面处形成了高质量的电子通道。 2DEG通道的形成进一步被载流子密度的弱温度依赖性所证实,并且发现低温迁移率的峰值为2790 cm(2)/ Vs,大大高于在大体积掺杂的Beta-相氧化镓(β-Ga2O3)。观察到的SdH振荡允许(010)平面中的电子有效质量的提取为0.313 +/- 0.015 m(0),并且在3.5K时的量子散射时间为0.33 ps。已证明的调制掺杂的β-(AlxGa1-x)(2)O-3 / Ga2O3结构为未来探索基于β-Ga2O3材料系统的量子物理现象和半导体器件技术奠定了基础。由AIP Publishing发布。

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  • 来源
    《Applied Physics Letters》 |2018年第17期|173502.1-173502.5|共5页
  • 作者单位

    Ohio State Univ, Dept Elect & Comp Engn, Columbus, OH 43210 USA;

    Air Force Res Lab, Mat & Mfg Directorate, Wright Patterson AFB, OH 45433 USA;

    Ohio State Univ, Dept Elect & Comp Engn, Columbus, OH 43210 USA;

    Ohio State Univ, Dept Elect & Comp Engn, Columbus, OH 43210 USA;

    Ohio State Univ, Dept Mat Sci & Engn, 116 W 19Th Ave, Columbus, OH 43210 USA;

    Ohio State Univ, Dept Mech & Aerosp Engn, Columbus, OH 43210 USA;

    Ohio State Univ, Dept Elect & Comp Engn, Columbus, OH 43210 USA;

    Ohio State Univ, Dept Elect & Comp Engn, Columbus, OH 43210 USA;

    Air Force Res Lab, Sensors Directorate, Wright Patterson AFB, OH 45433 USA;

    Air Force Res Lab, Sensors Directorate, Wright Patterson AFB, OH 45433 USA;

    Ohio State Univ, Dept Mat Sci & Engn, 116 W 19Th Ave, Columbus, OH 43210 USA;

    Ohio State Univ, Dept Mat Sci & Engn, 116 W 19Th Ave, Columbus, OH 43210 USA;

    Ohio State Univ, Dept Elect & Comp Engn, Columbus, OH 43210 USA;

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