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Gold fillings unravel the vacancy role in the phase transition of GeTe

机译:金填充物揭示了GeTe相变中的空位作用

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摘要

Phase change memory (PCM) is an important candidate for future memory devices. The crystalline phase of PCM materials contains abundant intrinsic vacancies, which plays an important role in the rapid phase transition upon memory switching. However, few experimental efforts have been invested to study these invisible entities. In this work, Au dopants are alloyed into the crystalline GeTe to fill the intrinsic Ge vacancies so that the role of these vacancies in the amorphization of GeTe can be indirectly studied. As a result, the reduction of Ge vacancies induced by Au dopants hampers the amorphization of GeTe as the activation energy of this process becomes higher. This is because the vacancy-interrupted lattice can be "repaired" by Au dopants with the recovery of bond connectivity. Our results demonstrate the importance of vacancies in the phase transition of chalcogenides, and we employ the percolation theory to explain the impact of these intrinsic defects on this vacancy-ridden crystal quantitatively. Specifically, the threshold of amorphization increases with the decrease in vacancies. The understanding of the vacancy effect sheds light on the long-standing puzzle of the mechanism of ultra-fast phase transition in PCMs. It also paves the way for designing low-power-consumption electronic devices by reducing the threshold of amorphization in chalcogenides. Published by AIP Publishing.
机译:相变存储器(PCM)是未来存储设备的重要候选产品。 PCM材料的晶相包含丰富的固有空位,这在存储器切换时的快速相变中起重要作用。但是,很少有实验工作投入到研究这些隐形实体上。在这项工作中,将金掺杂剂掺入晶体GeTe中以填充固有的Ge空位,以便可以间接研究这些空位在GeTe非晶化中的作用。结果,随着该过程的活化能变高,由金掺杂剂引起的Ge空位的减少阻碍了GeTe的非晶化。这是因为空位中断的晶格可以被金掺杂剂“修复”,并恢复键的连接性。我们的结果证明了空位在硫族化物相变中的重要性,我们采用渗流理论来定量解释这些固有缺陷对空位晶体的影响。具体而言,非晶化的阈值随着空位的减少而增加。对空位效应的理解为PCM中超快速相变机理的长期困扰提供了启示。它还通过降低硫族化物中的非晶化阈值,为设计低功耗电子设备铺平了道路。由AIP Publishing发布。

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  • 来源
    《Applied Physics Letters》 |2018年第7期|071902.1-071902.5|共5页
  • 作者单位

    Huazhong Univ Sci & Technol, Wuhan Natl Res Ctr Optoelect, Sch Opt & Elect Informat, Wuhan 430074, Hubei, Peoples R China;

    Huazhong Univ Sci & Technol, Wuhan Natl Res Ctr Optoelect, Sch Opt & Elect Informat, Wuhan 430074, Hubei, Peoples R China;

    Huazhong Univ Sci & Technol, Wuhan Natl Res Ctr Optoelect, Sch Opt & Elect Informat, Wuhan 430074, Hubei, Peoples R China;

    Huazhong Univ Sci & Technol, Wuhan Natl Res Ctr Optoelect, Sch Opt & Elect Informat, Wuhan 430074, Hubei, Peoples R China;

    Huazhong Univ Sci & Technol, Wuhan Natl Res Ctr Optoelect, Sch Opt & Elect Informat, Wuhan 430074, Hubei, Peoples R China;

    Huazhong Univ Sci & Technol, Wuhan Natl Res Ctr Optoelect, Sch Opt & Elect Informat, Wuhan 430074, Hubei, Peoples R China;

    Huazhong Univ Sci & Technol, Wuhan Natl Res Ctr Optoelect, Sch Opt & Elect Informat, Wuhan 430074, Hubei, Peoples R China;

    Huazhong Univ Sci & Technol, Wuhan Natl Res Ctr Optoelect, Sch Opt & Elect Informat, Wuhan 430074, Hubei, Peoples R China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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