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Temperature effect on the electrical and optical properties of indium-selenide thin-films

机译:温度对硒化铟薄膜电和光学性能的影响

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Indium-Selenide thin-films have been prepared by the thermal-evaporation technique at a pressure of 4.5 x 10~(-6) torr and a temperature of 673-873 K. For both the as-deposited and annealed films, (ⅰ) the electrical conductivity increased with increasing temperature and (ⅱ) the variation of activation energy follows the island structure theory. The temperature co-efficient of resistance (T.C.R.) and Hall-effect measurements indicate that the sample is a n-type carrier. The optical spectra for both types of films were obtained in the wavelength range 0.3 < λ < 2.5 μm, and by comparing the magnitude of transmittance spectra, it is found that the annealed films are more transparent than the as-deposited ones in the UV and visible range. The integrated transmittance and reflectance values were obtained: the high values of T_(lum) and T_(sol) for the annealed films suggest that indium selenide may be used in selective-surface devices.
机译:硒化铟薄膜是通过热蒸发技术在4.5 x 10〜(-6)托的压力和673-873 K的温度下制备的。对于沉积和退火薄膜,(ⅰ)电导率随温度升高而增加,(ⅱ)活化能的变化遵循岛结构理论。电阻的温度系数(T.C.R.)和霍尔效应测量表明样品是n型载体。在0.3 <λ<2.5μm的波长范围内获得了两种类型的薄膜的光谱,并且通过比较透射光谱的大小,发现退火后的薄膜比在UV和UV下沉积的薄膜更透明。可见范围。获得了综合的透射率和反射率值:退火膜的T_(lum)和T_(sol)的高值表明硒化铟可用于选择性表面器件。

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