首页> 外文期刊>Advanced Optical Materials >Perovskite Quantum Dots Embedded Composite Films Enhancing UV Response of Silicon Photodetectors for Broadband and Solar-Blind Light Detection
【24h】

Perovskite Quantum Dots Embedded Composite Films Enhancing UV Response of Silicon Photodetectors for Broadband and Solar-Blind Light Detection

机译:钙钛矿量子点嵌入式复合膜增强了硅光电探测器的宽带和太阳盲光检测的紫外线响应

获取原文
获取原文并翻译 | 示例
           

摘要

In this work, the integration of in situ fabricated perovskite quantum dotsrnembedded composite films (PQDCFs) as downshifting materials is firstrnreported for enhancing the ultraviolet (UV) response of silicon (Si) photodetectorsrntoward broadband and solar-blind light detection. External quantumrnefficiency measurements show that the UV response of PQDCF coated Sirnphotodiodes greatly improves from near 0% to at most of 50.6% ± 0.5% @rn290 nm. As compared to the calculated maximum value of 87%, the light couplingrnefficiency of the integrated device is determined to be 80%@395 nm,rnsuggesting an efficient downshifting process. Furthermore, PQDCF is alsornsuccessfully adapted for electron multiplying charge coupled device (EMCCD)rnbased image sensor. The PQDCF coated EMCCD shows linear responsernwith high-resolution imaging under illumination at 360, 620, and 960 nm,rnimplying the ability of broadband light detection in the UV, visible (VIS), andrnnear infrared (NIR) region. Furthermore, a solar-blind UV detection is demonstratedrnby integrating a solar-blind UV filter with PQDCF coated EMCCD.rnIn all, the use of PQDCF as luminescent downshifting materials provides anrneffective and low-cost way to improve the UV response of Si photodetectors.
机译:在这项工作中,首次报道了将原位制造的钙钛矿量子点嵌入复合膜(PQDCF)作为降档材料的集成,以增强硅(Si)光电探测器向宽带和日光盲光探测的紫外线(UV)响应。外部量子效率测量结果表明,PQDCF涂覆的Sirn光电二极管的紫外线响应在290 nm处从接近0%大大提高到最多50.6%±0.5%。与计算出的最大值87%相比,集成设备的光耦合效率被确定为395 nm @ 80%,这意味着需要进行有效的降档过程。此外,PQDCF还成功地适用于基于电子倍增电荷耦合器件(EMCCD)的图像传感器。涂有PQDCF的EMCCD在360、620和960 nm的照明下显示高分辨率的线性响应,这暗示了在紫外,可见(VIS)和近红外(NIR)区域的宽带光检测能力。此外,通过将日光盲紫外滤光片与PQDCF涂层的EMCCD集成在一起,证明了日光盲紫外检测。总而言之,将PQDCF用作发光降档材料可提供一种有效且低成本的方法来改善Si光电探测器的UV响应。

著录项

  • 来源
    《Advanced Optical Materials》 |2018年第16期|1800077.1-1800077.7|共7页
  • 作者单位

    Beijing Key Laboratory of Nanophotonics and Ultrafine OptoelectronicSystemsSchool of Optics and PhotonicsBeijing Institute of TechnologyBeijing 100081, China East China Institute of Optoelectronic Integrated DeviceSuzhou 215163, China;

    Beijing Key Laboratory of Nanophotonics and Ultrafine OptoelectronicSystemsSchool of Optics and PhotonicsBeijing Institute of TechnologyBeijing 100081, China;

    School of Materials Science and EngineeringBeijing Institute of TechnologyBeijing 100081, China;

    School of Materials Science and EngineeringBeijing Institute of TechnologyBeijing 100081, China;

    Beijing Key Laboratory of Nanophotonics and Ultrafine OptoelectronicSystemsSchool of Optics and PhotonicsBeijing Institute of TechnologyBeijing 100081, China;

    Beijing Key Laboratory of Nanophotonics and Ultrafine OptoelectronicSystemsSchool of Optics and PhotonicsBeijing Institute of TechnologyBeijing 100081, China East China Institute of Optoelectronic Integrated DeviceSuzhou 215163, China;

    East China Institute of Optoelectronic Integrated DeviceSuzhou 215163, China;

    School of Materials Science and EngineeringBeijing Institute of TechnologyBeijing 100081, China;

    Beijing Key Laboratory of Nanophotonics and Ultrafine OptoelectronicSystemsSchool of Optics and PhotonicsBeijing Institute of TechnologyBeijing 100081, China;

    School of Materials Science and EngineeringBeijing Institute of TechnologyBeijing 100081, China;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    composite films; downshifting; photodetectors; quantum dots; silicon;

    机译:复合膜;降档光电探测器量子点;硅;

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号