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首页> 外文期刊>Advanced Optical Materials >Ultrathin High Quality-Factor Planar Absorbers/Emitters Based on Uniaxial/Biaxial Anisotropic van der Waals Polar Crystals
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Ultrathin High Quality-Factor Planar Absorbers/Emitters Based on Uniaxial/Biaxial Anisotropic van der Waals Polar Crystals

机译:超超高级系式平面吸收剂/基于单轴/双轴各向异性van der Waals极性晶体的发射器

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摘要

Tailoring the absorption/emission through nanostructures from broadband to narrowband has attracted increasing attention due to the merits of high efficiency and compactness. However, most of the reported narrowband emitters require either complex fabrication process or thick coating of the suitable materials (similar to mm). In this paper, by exciting Berreman mode through a combination of Au mirrors and ultra-thin layers of low-loss uniaxial/biaxial anisotropic 2D van der Waals polar crystal hBN/alpha-MoO3, a narrowband absorption/emission peak is realized in the mid-infrared region. The measured quality-factor of Berreman mode for hBN/Au and alpha-MoO3/Au structure can reach up to 134 and 164, respectively. The deep subwavelength thickness (similar to nm) and bilayer architecture simplify the fabrication process. Furthermore, taking advantage of the in-plane birefringence originating from alpha-MoO3, the polarization of the absorbed/emitted radiation can be controlled through this planar configuration. Such ultrathin narrowband absorbers/emitters provide new opportunities for the advancements in thermal sources, infrared sensors, and thermophotovoltaic power generation systems.
机译:由于高效率和紧凑性的优点,通过宽带到窄带的纳米结构剪裁吸收/排放引起了越来越多的关注。然而,大多数报道的窄带发射器需要复杂的制造工艺或厚的合适材料(类似于mm)。在本文中,通过Au镜子和超薄层的组合激发Berreman模式,低损耗单轴/双轴各向异性2D范德瓦尔斯极性HBN / alpha-Moo3,在中间实现窄带吸收/排放峰 - 过渡区域。 HBN / AU和Alpha-Moo3 / Au结构的测量质量因子分别可以达到134和164。深度亚波长厚度(类似于NM)和双层架构简化了制造过程。此外,利用源自α-Moo3的平面双折射,可以通过该平面配置来控制吸收/发射辐射的偏振。这种超薄窄带吸收剂/发射器为热源,红外传感器和蒸汽热源发电系统的进步提供了新的机会。

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  • 来源
    《Advanced Optical Materials》 |2021年第21期|2100645.1-2100645.9|共9页
  • 作者单位

    Zhejiang Univ Coll Opt Sci & Engn State Key Lab Modern Opt Instrumentat Hangzhou 310027 Peoples R China;

    Zhejiang Univ Coll Opt Sci & Engn State Key Lab Modern Opt Instrumentat Hangzhou 310027 Peoples R China;

    Zhejiang Univ Coll Opt Sci & Engn State Key Lab Modern Opt Instrumentat Hangzhou 310027 Peoples R China;

    Zhejiang Univ Coll Opt Sci & Engn State Key Lab Modern Opt Instrumentat Hangzhou 310027 Peoples R China;

    Zhejiang Univ Coll Opt Sci & Engn State Key Lab Modern Opt Instrumentat Hangzhou 310027 Peoples R China;

    Zhejiang Univ Coll Opt Sci & Engn State Key Lab Modern Opt Instrumentat Hangzhou 310027 Peoples R China;

    Zhejiang Univ Coll Opt Sci & Engn State Key Lab Modern Opt Instrumentat Hangzhou 310027 Peoples R China;

    Westlake Univ Sch Engn Key Lab 3D Micro Nano Fabricat & Characterizat Zh 18 Shilongshan Rd Hangzhou 310024 Peoples R China|Westlake Inst Adv Study Inst Adv Technol 18 Shilongshan Rd Hangzhou 310024 Peoples R China;

    Zhejiang Univ Coll Opt Sci & Engn State Key Lab Modern Opt Instrumentat Hangzhou 310027 Peoples R China;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Berreman mode; narrowband absorber; emitter; thermal emission; van der Waals polar crystals;

    机译:Berreman模式;窄带吸收剂;发射器;热排放;van der Waals极性晶体;

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