首页> 美国卫生研究院文献>Iranian Journal of Pharmaceutical Research : IJPR >Removal of Azithromycin from Aqueous Solution Using UV- Light Alone and UV Plus Persulfate (UV/Na2S2O8) Processes
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Removal of Azithromycin from Aqueous Solution Using UV- Light Alone and UV Plus Persulfate (UV/Na2S2O8) Processes

机译:使用单独的UV光和UV加过硫酸盐(UV / Na2S2O8)工艺从水溶液中去除阿奇霉素

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摘要

Azithromycin is among the broad-spectrum antibiotics that is widely available in various environmental systems and could have destructive effects on the ecosystem and human health due to its bacterial resistance. In this study, removal of azithromycin from wastewater using an advanced oxidation process of ultraviolet light with and without persulfate was investigated and effective parameters for the management of each of the processes were evaluated. The effect of different parameters including the concentration of Azithromycin antibiotic at levels 5, 15, 45 mgL-1; the concentration of persulfate at levels 1, 2, 4 mmol; pH at levels 5, 7, 9, contact time in 30, 60, 90 minute range of azithromycin removal was investigated. Ultraviolet light at a wavelength of 254 nanometers was used to irradiate the reactor. The results showed that azithromycin removal was significantly lower in the presence of ultraviolet radiation alone 58% with the removal efficiency than the case that ultraviolet radiation was used with sodium persulfate 98%. The best azithromycin removal conditions were obtained at the removal efficiency with the initial concentration of antibiotic 5 mgL-1, the concentration of persulfate 1mmol, and the contact time 30 min. and pH = 7. The rate of decrease in the concentration of residual azithromycin is increasing with increasing sodium persulfate concentration and decreasing the initial azithromycin concentration. This research can help to apply the integrated use of advanced oxidation processes to idealize decomposition-resistant compounds removal processes and to better understand the parameters affecting the removal.
机译:阿奇霉素是广谱抗生素之一,可在各种环境系统中广泛使用,并且由于其细菌抗性可能对生态系统和人类健康产生破坏性影响。在这项研究中,研究了使用先进的紫外光氧化工艺(有或没有过硫酸盐)从废水中去除阿奇霉素的方法,并评估了管理每个工艺的有效参数。不同参数的影响,包括阿奇霉素抗生素浓度分别为5、15、45 mgL -1 ;过硫酸盐的浓度为1、2、4 mmol;研究了在5、7、9,接触时间在30、60、90分钟范围内的阿奇霉素去除的pH值。使用波长为254纳米的紫外线照射反应器。结果表明,与仅使用紫外线辐射和98%过硫酸钠的情况相比,仅在有紫外线辐射的情况下,阿奇霉素的去除效率为58%,明显降低。以抗生素的初始浓度5 mgL -1 ,过硫酸盐的浓度为1mmol,接触时间为30 min时,去除阿奇霉素的效果最佳。 pH =7。残留阿奇霉素浓度的降低速率随着过硫酸钠的浓度增加和阿奇霉素初始浓度的降低而增加。这项研究可以帮助将高级氧化过程的综合应用理想化抗分解化合物的去除过程,并更好地理解影响去除的参数。

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