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Performance Optimization of FD-SOI Hall Sensors Via 3D TCAD Simulations

机译:通过3D TCAD模拟FD-SOI霍尔传感器的性能优化

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摘要

This work investigates the behavior of fully depleted silicon-on-insulator (FD-SOI) Hall sensors with an emphasis on their physical parameters, namely the aspect ratio, doping concentration, and thicknesses. Via 3D-technology computer aided design (TCAD) simulations with a galvanomagnetic transport model, the performances of the Hall voltage, sensitivity, efficiency, offset voltage, and temperature characteristics are evaluated. The optimal structure of the sensor in the simulation has a sensitivity of 86.5 mV/T and an efficiency of 218.9 V/WT at the bias voltage of 5 V. In addition, the effects of bias, such as the gate voltage and substrate voltage, on performance are also simulated and analyzed. Optimal structure and bias design rules are proposed, as are some adjustable trade-offs that can be chosen by designers to meet their own Hall sensor requirements.
机译:这项工作研究了完全耗尽的硅 - 绝缘体(FD-SOI)霍尔传感器的行为强调其物理参数,即纵横比,掺杂浓度和厚度。通过3D-Technology计算机辅助设计(TCAD)模拟具有镀锌传输模型,评估了霍尔电压,灵敏度,效率,偏移电压和温度特性的性能。在模拟中的传感器的最佳结构具有86.5 mV / t的灵敏度,并且在5V的偏置电压下的效率为218.9V / wt。此外,偏置的效果,例如栅极电压和基板电压,还模拟和分析了性能。提出了最佳结构和偏置设计规则,可以由设计人员选择的一些可调权衡,以满足自己的霍尔传感器要求。

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