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Structure of Diamond Films Grown Using High-Speed Flow of a Thermally Activated CH4-H2 Gas Mixture

机译:热活化CH4-H2气体混合物的高速流动生长的金刚石膜的结构

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摘要

Diamond films are advanced engineering materials for various industrial applications requiring a coating material with extremely high thermal conductivity and low electrical conductivity. An approach for the synthesis of diamond films via high-speed jet deposition of thermally activated gas has been applied. In this method, spatially separated high-speed flows of methane and hydrogen were thermally activated, and methyl and hydrogen radicals were deposited on heated molybdenum substrates. The morphology and structure of three diamond films were studied, which were synthesized at a heating power of 900, 1700, or 1800 W, methane flow rate of 10 or 30 sccm, hydrogen flow rate of 1500 or 3500 sccm, and duration of the synthesis from 1.5 to 3 h.The morphology and electronic state of the carbon on the surface and in the bulk of the obtained films were analyzed by scanning electron microscopy, Raman scattering, X-ray photoelectron, and near-edge X-ray absorption fine structure spectroscopies. The diamond micro-crystals with a thick oxidized amorphous -carbon coating were grown at a heating power of 900 W and a hydrogen flow rate of 1500 sccm. The quality of the crystals was improved, and the growth rate of the diamond film was increased seven times when the heating power was 1700–1800 W and the methane and hydrogen flow rates were 30 and 3500 sccm, respectively. Defective octahedral diamond crystals of 30 μm in size with a thin -carbon surface layer were synthesized on a Mo substrate heated at 1273 K for 1.5 h. When the synthesis duration was doubled, and the substrate temperature was decreased to 1073 K, the denser film with rhombic-dodecahedron diamond crystals was grown. In this case, the thinnest hydrogenated -carbon coating was detected on the surface of the diamond crystals.
机译:金刚石膜是用于各种工业应用的高级工程材料,需要具有极高导热率和低导电率的涂料。已经应用了通过热活化气体的高速喷射沉积来合成金刚石膜的方法。在这种方法中,甲烷和氢气在空间上分开的高速流动被热活化,甲基和氢自由基沉积在加热的钼基板上。研究了三种金刚石薄膜的形貌和结构,它们是在900、1700或1800 W的加热功率,10或30 sccm的甲烷流速,1500或3500 sccm的氢气流速以及合成的持续时间下合成的1.5〜3 h,通过扫描电子显微镜,拉曼散射,X射线光电子和近边缘X射线吸收精细结构分析了所得膜的表面和大部分中碳的形态和电子状态光谱学。在900 W的加热功率和1500 sccm的氢气流速下,生长出具有厚氧化无定形碳涂层的金刚石微晶。当加热功率为1700-1800 W,甲烷和氢气流量分别为30和3500 sccm时,晶体的质量得到改善,金刚石膜的生长速率提高了7倍。在以1273 K加热1.5 h的Mo衬底上合成了尺寸为30μm的具有薄碳表面层的有缺陷的八面体金刚石晶体。当合成时间延长一倍,并且基板温度降低到1073 K时,生长出带有菱形十二面体金刚石晶体的致密膜。在这种情况下,在金刚石晶体的表面上检测到最薄的氢化碳涂层。

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