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Properties of Arsenic–Doped ZnTe Thin Films as a Back Contact for CdTe Solar Cells

机译:掺砷的ZnTe薄膜作为CdTe太阳能电池的背触点的特性

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摘要

As-doped polycrystalline ZnTe layers grown by metalorganic chemical vapor deposition (MOCVD) have been investigated as a back contact for CdTe solar cells. While undoped ZnTe films were essentially insulating, the doped layers showed significant rise in conductivity with increasing As concentration. High p-type carrier densities up 4.5 × 10 cm was measured by the Hall-effect in heavily doped ZnTe:As films, displaying electrical properties comparable to epitaxial ZnTe single crystalline thin films in the literature. Device incorporation with as-deposited ZnTe:As yielded lower photovoltaic (PV) performance compared to reference devices, due to losses in the open-circuit potential (V ) and fill factor (FF) related to reducing p-type doping density ( ) in the absorber layer. Some minor recovery observed in absorber doping following a Cl-free post–ZnTe:As deposition anneal in hydrogen at 420 °C contributed to a slight improvement in V and , highlighting the significance of back contact activation. A mild CdCl activation process on the ZnTe:As back contact layer via a sacrificial CdS cap layer has been assessed to suppress Zn losses, which occur in the case of standard CdCl anneal treatments (CHT) via formation of volatile ZnCl . The CdS sacrificial cap was effective in minimising the Zn loss. Compared to untreated and non-capped, mild CHT processed ZnTe:As back contacted devices, mild CHT with a CdS barrier showed the highest recovery in absorber doping and an ~10 mV gain in V with the best cell efficiency approaching the baseline devices.
机译:已经研究了通过金属有机化学气相沉积(MOCVD)生长的As掺杂多晶ZnTe层作为CdTe太阳能电池的背接触。尽管未掺杂的ZnTe薄膜基本上是绝缘的,但随着As浓度的增加,掺杂层的电导率显着提高。通过霍尔效应在重掺杂的ZnTe:As薄膜中测量了高达4.5×10 cm的高p型载流子密度,显示出与文献中的外延ZnTe单晶薄膜相当的电性能。与参考器件相比,结合了沉积的ZnTe:As的器件产生的光伏(PV)性能较低,这是由于与降低p型掺杂密度()有关的开路电势(V)和填充因子(FF)的损失。吸收层。在420°C的氢气中进行无氯后ZnTe:As沉积退火后,在吸收剂掺杂中观察到一些轻微的恢复,这有助于改善V和,从而突出了背接触激活的重要性。已经评估了通过牺牲性CdS覆盖层对ZnTe:As背接触层进行温和的CdCl活化过程,以抑制Zn的损失,这在标准CdCl退火处理(CHT)中通过形成挥发性ZnCl发生。 CdS牺牲帽可有效减少锌的损失。与未经处理和未加盖的,温和的CHT处理的ZnTe:Zn背接触器件相比,具有CdS势垒的温和的CHT在吸收剂掺杂方面显示出最高的恢复率,在V中获得了约10 mV的增益,最佳电池效率接近基线器件。

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