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Improvement of SiC Crystal Growth Rate and Uniformity via Top-Seeded Solution Growth under External Static Magnetic Field: A Numerical Investigation

机译:外部静磁场下通过顶晶溶液生长提高SiC晶体生长速率和均匀性的数值研究

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摘要

Silicon carbide (SiC) is an ideal material for high-power and high-performance electronic applications. Top-seeded solution growth (TSSG) is considered as a potential method for bulk growth of high-quality SiC single crystals from the liquid phase source material. The crystal growth performance, such as growth rate and uniformity, is driven by the fluid flow and constitutional flux in the solution. In this study, we numerically investigate the contribution of the external static magnetic field generated by Helmholtz coils to the fluid flow in the silicon melt. Depending on the setup of the Helmholtz coils, four static magnetic field distributions are available, namely, uniform vertical upward/downward and vertical/horizontal cusp. Based on the calculated carbon flux coming to the crystal surface, the vertical downward magnetic field proved its ability to enhance the growth rate as well as the uniformity of the grown crystal.
机译:碳化硅(SiC)是高功率和高性能电子应用的理想材料。种子生长溶液(TSSG)被认为是从液相源材料大量生长高质量SiC单晶的一种潜在方法。晶体的生长性能,例如生长速率和均匀性,是由溶液中的流体流动和结构通量驱动的。在这项研究中,我们数值研究了亥姆霍兹线圈产生的外部静磁场对硅熔体中流体流动的影响。根据亥姆霍兹线圈的设置,可以使用四种静磁场分布,即均匀的垂直向上/向下和垂直/水平尖点。根据计算得出的到达晶体表面的碳通量,垂直向下的磁场证明了它具有提高生长速率以及生长晶体均匀性的能力。

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