Enhanced wettability of SU-8 photoresist through a photografting procedure for bioanalytical device applications

摘要

In this work, we detail a method whereby a polymeric hydrogel layer is grafted to the negative tone photoresist SU-8 in order to improve its wettability. A photoinitiator is first immobilized on freshly prepared SU-8 samples, acting as the starting point for various surface modifications strategies. Grafting of a 2-hydroxyethylmethacrylate-based hydrogel from the SU-8 surface resulted in the reduction of the static contact angle of a water droplet from 79 ± 1° to 36 ± 1°, while addition of a poly(ethylene glycol)-rich hydrogel layer resulted in further improvement (8 ± 1°). Wettability is greatly enhanced after 30 minutes of polymerization, with a continued but more gradual decrease in contact angle up to approximately 50 minutes. Hydrogel formation is triggered by exposure to UV irradiation, allowing for the formation of photopatterned structures using existing photolithographic techniques.