Response surface methodology (RSM) modeling to improve removal of ciprofloxacin from aqueous solutions in photocatalytic process using copper oxide nanoparticles (CuO/UV)

摘要

Ciprofloxacin (CIP) antibiotic is considered as an emerging and biological resistant pollutant. This study aimed to improve of the removal of CIP from synthetic aqueous solutions in photocatalytic process through copper oxide nanoparticles as catalyst (CuO/UV). The effect of CIP concentration (10–200 mg/l), catalyst dosage included CuO (0.01–0.1 g/l) and pH (3–11) as independent variables on the COD removal efficiency as response in photocatalytic process using UV-C lamps with three different powers of 8, 15 and 30-W were optimized through the central composite design in response surface method using design-expert software. A second order model was selected as the best model with R² values and lack of fit as 0.85 and 0.06 for lamp 8-W, 0.89 and 0.11 for lamp 15-W, and 0.86 and 0.19 for lamp 30-W, respectively. Optimum conditions were obtained in CIP concentration of 11.2 (mg/l), CuO dosage of 0.08 (g/l), and pH value of 8.17. In this condition, predicted maximum COD removal was respectively found 83.79, 93.18, and 98.90% for lamps 8, 15 and 30-W. According to the results, photocatalytic process using copper oxide nanoparticles can effectively compose CIP in aqueous solutions.