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Electrical transportation mechanisms of molybdenum disulfide flakes-graphene quantum dots heterostructure embedded in polyvinylidene fluoride polymer

机译:聚偏二氟乙烯聚合物中嵌入的二硫化钼薄片-石墨烯量子点异质结构的电输运机理

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摘要

In the interest of the trend towards miniaturization of electronic gadgets, this study demonstrates a high-density data storage device with a very simple three-stacking layer consisting of only one charge trapping layer. A simple solution-processed technique has been used to fabricate the tristable non-volatile memory. The three-stacking layer was constructed in between two metals to form a two-terminal metal-insulator-metal structure. The fabricated device showed a large multilevel memory hysteresis window with a measured ON/OFF current ratio of 107 that might be attributed to the high charge trapped in molybdenum disulphide (MoS2) flakes-graphene quantum dots (GQDs) heterostructure. Transmission electron microscopy was performed to examine the orientation of MoS2-GQD and mixture dispersion preparation method. The obtained electrical data was used further to speculate the possible transport mechanisms through the fabricated device by a curve fitting technique. Also, endurance cycle and retention tests were performed at room temperature to investigate the stability of the device.
机译:为了实现电子产品的小型化趋势,本研究演示了一种高密度数据存储设备,该设备具有一个非常简单的仅由一个电荷捕获层组成的三层堆叠层。一种简单的解决方案处理技术已用于制造三稳态非易失性存储器。在两个金属之间构造三堆叠层,以形成两个端子的金属-绝缘体-金属结构。制成的器件显示出大的多级存储器滞后窗口,测得的开/关电流比为10 7 ,这可能归因于二硫化钼(MoS2)片状石墨烯量子点(GQD)中捕获的高电荷)异质结构。用透射电子显微镜检查了MoS2-GQD的取向和混合物分散体的制备方法。所获得的电数据被进一步用于通过曲线拟合技术推测通过制造的装置的可能的传输机制。另外,在室温下进行了耐久周期和保持力测试,以研究设备的稳定性。

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