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Interfacial Properties of Monolayer and Bilayer MoS2 Contacts with Metals: Beyond the Energy Band Calculations

机译:MoS2单层和双层金属接触的界面性质:超出能带计算

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摘要

Although many prototype devices based on two-dimensional (2D) MoS2 have been fabricated and wafer scale growth of 2D MoS2 has been realized, the fundamental nature of 2D MoS2-metal contacts has not been well understood yet. We provide a comprehensive ab initio study of the interfacial properties of a series of monolayer (ML) and bilayer (BL) MoS2-metal contacts (metal = Sc, Ti, Ag, Pt, Ni, and Au). A comparison between the calculated and observed Schottky barrier heights (SBHs) suggests that many-electron effects are strongly suppressed in channel 2D MoS2 due to a charge transfer. The extensively adopted energy band calculation scheme fails to reproduce the observed SBHs in 2D MoS2-Sc interface. By contrast, an ab initio quantum transport device simulation better reproduces the observed SBH in 2D MoS2-Sc interface and highlights the importance of a higher level theoretical approach beyond the energy band calculation in the interface study. BL MoS2-metal contacts generally have a reduced SBH than ML MoS2-metal contacts due to the interlayer coupling and thus have a higher electron injection efficiency.
机译:尽管已经制造了许多基于二维(2D)MoS2的原型设备,并且已经实现了2D MoS2的晶圆级生长,但是2D MoS2金属触点的基本性质尚未得到很好的理解。我们提供了一系列从头开始的全面研究,研究了一系列单层(ML)和双层(BL)MoS2-金属触点(金属= Sc,Ti,Ag,Pt,Ni和Au)的界面性质。在计算出的肖特基势垒高度与观察到的肖特基势垒高度(SBHs)之间进行比较,结果表明,由于电荷转移,通道2D MoS2中的多电子效应得到了显着抑制。广泛采用的能带计算方案无法在2D MoS2-Sc界面中重现观察到的SBH。相比之下,从头算起量子传输设备的仿真可以更好地重现2D MoS2-Sc界面中观察到的SBH,并强调了界面研究中除能带计算之外的更高级理论方法的重要性。由于层间耦合,BL MoS2-金属触点通常比ML MoS2-金属触点具有更低的SBH,因此具有更高的电子注入效率。

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