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A p-i-n junction diode based on locally doped carbon nanotube network

机译:基于局部掺杂碳纳米管网络的p-i-n结二极管

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摘要

A p-i-n junction diode constructed by the locally doped network of single-walled carbon nanotubes (SWNTs) was investigated. In this diode, the two opposite ends of the SWNT-network channel were selectively doped by triethyloxonium hexachloroantimonate (OA) and polyethylenimine (PEI) to obtain the air-stable p- and n-type SWNTs respectively while the central area of the SWNT-network remained intrinsic state, resulting in the formation of a p-i-n junction with a strong built-in electronic field in the SWNTs. The results showed that the forward current and the rectification ratio of the diode increased as the doping degree increased. The forward current of the device could also be increased by decreasing the channel length. A high-performance p-i-n junction diode with a high rectification ratio (~104), large forward current (~12.2 μA) and low reverse saturated current (~1.8 nA) was achieved with the OA and PEI doping time of 5 h and 18 h for a channel length of ~6 μm.
机译:研究了由单壁碳纳米管(SWNT)的局部掺杂网络构成的p-i-n结二极管。在此二极管中,SWNT网络通道的两个相对端分别被六氯锑酸三乙基氧鎓氧鎓(OA)和聚乙烯亚胺(PEI)选择性掺杂,从而分别获得了空气稳定的p型和n型SWNT,而SWNT-网络保持固有状态,从而在SWNT中形成带有强内置电场的针形结。结果表明,随着掺杂度的增加,二极管的正向电流和整流比均增加。器件的正向电流也可以通过减小沟道长度来增加。通过OA和PEI实现了具有高整流比(〜10 4 ),大正向电流(〜12.2μA)和低反向饱和电流(〜1.8 nA)的高性能Pin结二极管沟道长度约为6μm时,掺杂时间为5 h和18 h。

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