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Understanding of multi-level resistive switching mechanism in GeOx through redox reaction in H2O2/sarcosine prostate cancer biomarker detection

机译:通过H2O2 /肌氨酸前列腺癌生物标志物检测中的氧化还原反应了解GeOx中的多级电阻转换机制

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摘要

Formation-free multi-level resistive switching characteristics by using 10 nm-thick polycrystalline GeOx film in a simple W/GeOx/W structure and understanding of switching mechanism through redox reaction in H2O2/sarcosine sensing (or changing Ge°/Ge4+ oxidation states under external bias) have been reported for the first time. Oxidation states of Ge0/Ge4+ are confirmed by both XPS and H2O2 sensing of GeOx membrane in electrolyte-insulator-semiconductor structure. Highly repeatable 1000 dc cycles and stable program/erase (P/E) endurance of >106 cycles at a small pulse width of 100 ns are achieved at a low operation current of 0.1 µA. The thickness of GeOx layer is found to be increased to 12.5 nm with the reduction of polycrystalline grain size of <7 nm after P/E of 106 cycles, which is observed by high-resolution TEM. The switching mechanism is explored through redox reaction in GeOx membrane by sensing 1 nM H2O2, which is owing to the change of oxidation states from Ge0 to Ge4+ because of the enhanced O2− ions migration in memory device under external bias. In addition, sarcosine as a prostate cancer biomarker with low concentration of 50 pM to 10 µM is also detected.
机译:通过在简单的W / GeOx / W结构中使用10 nm厚的多晶GeOx膜实现无形成的多级电阻开关特性,并了解H2O2 /肌氨酸传感中通过氧化还原反应的开关机理(或改变Ge°/ Ge 首次报道了外部偏压下的4 + 氧化态。通过XPS和H2O2感测电解质-绝缘体-半导体结构中的GeOx膜,可以确定Ge 0 / Ge 4 + 的氧化态。在0.1µµA的低工作电流下,在100µns的小脉冲宽度下,可以实现高度可重复的1000 dc周期和稳定的> 10 6 周期的编程/擦除(P / E)耐久性。通过高分辨率TEM观察,在P / E的10 / sup> 6 循环后,随着<7crystallinenm的多晶晶粒尺寸的减小,GeOx层的厚度增加到了12.5 nm。通过检测1 nM H2O2在GeOx膜中的氧化还原反应来探索转换机制,这是由于氧化态从Ge 0 变为Ge 4 + 所致。外部偏压下增强的O 2-离子在存储设备中的迁移。此外,还检测到肌氨酸作为低浓度50 pM至10µµM的前列腺癌生物标志物。

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