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Color-selective photodetection from intermediate colloidal quantum dots buried in amorphous-oxide semiconductors

机译:掩埋在非晶氧化物半导体中的中间胶体量子点的颜色选择性光电检测

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摘要

We report color-selective photodetection from intermediate, monolayered, quantum dots buried in between amorphous-oxide semiconductors. The proposed active channel in phototransistors is a hybrid configuration of oxide-quantum dot-oxide layers, where the gate-tunable electrical property of silicon-doped, indium-zinc-oxide layers is incorporated with the color-selective properties of quantum dots. A remarkably high detectivity (8.1 × 1013 Jones) is obtained, along with three major findings: fast charge separation in monolayered quantum dots; efficient charge transport through high-mobility oxide layers (20 cm2 V−1 s−1); and gate-tunable drain-current modulation. Particularly, the fast charge separation rate of 3.3 ns−1 measured with time-resolved photoluminescence is attributed to the intermediate quantum dots buried in oxide layers. These results facilitate the realization of efficient color-selective detection exhibiting a photoconductive gain of 107, obtained using a room-temperature deposition of oxide layers and a solution process of quantum dots. This work offers promising opportunities in emerging applications for color detection with sensitivity, transparency, and flexibility.
机译:我们报道了掩埋在非晶氧化物半导体之间的中间单层量子点的颜色选择性光电检测。光电晶体管中提议的有源沟道是氧化物-量子点-氧化物层的混合配置,其中掺有硅的铟-锌-氧化物层的栅极可调电特性与量子点的颜色选择特性结合在一起。获得了极高的探测灵敏度(8.1×10 13 Jones),以及三个主要发现:单层量子点中的快速电荷分离;通过高迁移率氧化物层(20 cm 2 V -1 s -1 )的有效电荷传输;以及栅极可调的漏极电流调制。特别地,用时间分辨的光致发光测量的3.3 ns -1 的快速电荷分离率归因于埋在氧化物层中的中间量子点。这些结果有利于实现有效的颜色选择性检测,该检测显示出10 7 的光电导增益,这是通过使用室温下沉积氧化物层和量子点的溶解工艺获得的。这项工作为新兴的具有灵敏度,透明度和灵活性的颜色检测应用程序提供了广阔的机遇。

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