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Reactivity of O2 on Pd/Ru(0001) and PdRu/Ru(0001) surface alloys

机译:O2在Pd / Ru(0001)和PdRu / Ru(0001)表面合金上的反应性

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摘要

The reactivity of a Pd monolayer epitaxially grown on Ru(0001) toward O2 has been investigated by molecular beam techniques. O2 initial sticking coefficients were determined using the King and Wells method in the incident energy range of 40–450 meV and for sample temperatures of 100 K and 300 K, and compared to the corresponding values measured on the clean Ru(0001) and Pd(111) surfaces. In contrast to the high reactivity shown by Ru(0001) at 100 K, the Pd/Ru(0001) system exhibits a monotonic decrease in the sticking probability of O2 as a function of normal incident energy. At room temperature, the system was found to be inert. Thermal desorption measurements show that O2 is adsorbed molecularly at 100 K. A completely different behaviour has been measured for the Pd0.95Ru0.05/Ru(0001) surface alloy. On this surface, the O2 sticking probability increases with incident energy and resembles the one observed on the clean Ru(0001) surface, even at 300 K. Thermal desorption measurements point to dissociative adsorption of O2 in this system. Both the charge transfer from the Pd to the Ru substrate and the compressive strain on the Pd monolayer contribute to decrease in the reactivity of the Pd/Ru(0001) system well below those of both Ru(0001) and Pd(111).
机译:已经通过分子束技术研究了在Ru(0001)上外延生长的Pd单层对O2的反应性。使用King和Wells方法在40–450 meV的入射能量范围内以及100 K和300 K的样品温度下确定O2的初始黏着系数,并将其与在纯Ru(0001)和Pd( 111)表面。与Ru(0001)在100 K下显示的高反应性相反,Pd / Ru(0001)系统表现出O2的粘附概率随法向入射能量的变化而单调降低。在室温下,发现该系统是惰性的。热脱附测量表明,O2在100 K时被分子吸附。对于Pd0.95Ru0.05 / Ru(0001)表面合金,已测量出完全不同的行为。在此表面上,O 2粘附的可能性随着入射能量的增加而增加,甚至与在干净的Ru(0001)表面上观察到的粘附可能性相同,即使在300 K时也是如此。热解吸测量表明该系统中O 2的解离吸附。从Pd到Ru衬底的电荷转移以及Pd单层上的压缩应变都导致Pd / Ru(0001)系统的反应性降低,远低于Ru(0001)和Pd(111)的反应性。

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