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Electrodeposition of quaternary alloys in the presence of magnetic field

机译:磁场作用下四元合金的电沉积

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摘要

Electrodeposition of Ni-Co-Fe-Zn alloys was done in a chloride ion solution with the presence and absence of a Permanent Parallel Magnetic Field (PPMF). The PPMF was applied parallel to the cathode surface. The deposition profile was monitored chronoamperometrically. It was found that the electrodeposition current was enhanced in the presence of PPMF (9 T) compared to without PPMF. The percentage of current enhancement (Γ%) was increased in the presence of PPMF, with results of Γ% = 11.9%, 16.7% and 18.5% at -1.1, -1.2 and -1.3 V respectively for a 2400 sec duration. In chronoamperometry, the Composition Reference Line (CRL) for Ni was around 57%, although the nobler metals (i.e. Ni, Co) showed anomalous behaviour in the presence of Zn and Fe. The anomalous behaviour of the Ni-Co-Fe-Zn electrodeposition was shown by the Energy Dispersive X-Ray (EDX) results. From Atomic Force Microscopy (AFM) measurements, it was found that the surface roughness of the Ni-Co-Fe-Zn alloy films decreased in the presence of a PPMF.
机译:在存在和不存在永久平行磁场(PPMF)的情况下,在氯离子溶液中进行Ni-Co-Fe-Zn合金的电沉积。将PPMF平行于阴极表面施加。沉积轮廓通过计时电流法进行监测。发现与没有PPMF的情况相比,在PPMF(9T)存在下电沉积电流增加。在PPMF的存在下,电流增强的百分比(Γ%)增加,在-1.1,-1.2和-1.3 V的情况下,Γ%的结果分别为11.9%,16.7%和18.5%,持续2400秒。在计时电流法中,尽管在锌和铁的存在下贵金属(即镍,钴)表现出异常行为,但镍的成分参考线(CRL)约为57%。能量色散X射线(EDX)结果显示了Ni-Co-Fe-Zn电沉积的异常行为。从原子力显微镜(AFM)测量,发现在PPMF的存在下Ni-Co-Fe-Zn合金膜的表面粗糙度降低。

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