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Chemical Vapor Deposition of an Organic Magnet Vanadium Tetracyanoethylene

机译:有机磁铁钒三氯乙烯的化学气相沉积

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摘要

Recent progress in the field of organic materials has yielded devices such as organic light emitting diodes (OLEDs) which have advantages not found in traditional materials, including low cost and mechanical flexibility. In a similar vein, it would be advantageous to expand the use of organics into high frequency electronics and spin-based electronics. This work presents a synthetic process for the growth of thin films of the room temperature organic ferrimagnet, vanadium tetracyanoethylene (V[TCNE]x, x~2) by low temperature chemical vapor deposition (CVD). The thin film is grown at <60 °C, and can accommodate a wide variety of substrates including, but not limited to, silicon, glass, Teflon and flexible substrates. The conformal deposition is conducive to pre-patterned and three-dimensional structures as well. Additionally this technique can yield films with thicknesses ranging from 30 nm to several microns. Recent progress in optimization of film growth creates a film whose qualities, such as higher Curie temperature (600 K), improved magnetic homogeneity, and narrow ferromagnetic resonance line-width (1.5 G) show promise for a variety of applications in spintronics and microwave electronics.
机译:有机材料领域中的最新进展已经产生了诸如有机发光二极管(OLED)之类的器件,其具有在传统材料中未发现的优点,包括低成本和机械柔韧性。同样,将有机物的用途扩展到高频电子设备和自旋电子设备中也将是有利的。这项工作提出了一种通过低温化学气相沉积(CVD)生长室温有机亚铁磁体,四氰基钒化钒(V [TCNE] x,x〜2)薄膜的合成方法。薄膜是在<60°C的温度下生长的,可以容纳各种基板,包括但不限于硅,玻璃,特氟隆和柔性基板。保形沉积也有利于预构图和三维结构。另外,该技术可以产生厚度范围为30 nm至几微米的薄膜。薄膜生长优化的最新进展产生了一种薄膜,该薄膜的质量,例如更高的居里温度(600 K),改善的磁均匀性和较窄的铁磁共振线宽(1.5 G),显示了在自旋电子学和微波电子学中的各种应用前景。

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