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Quantitative Analysis of Electroplated Nickel Coating on Hard Metal

机译:硬质合金电镀镍涂层的定量分析

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摘要

Electroplated nickel coating on cemented carbide is a potential pretreatment technique for providing an interlayer prior to diamond deposition on the hard metal substrate. The electroplated nickel coating is expected to be of high quality, for example, indicated by having adequate thickness and uniformity. Electroplating parameters should be set accordingly for this purpose. In this study, the gap distances between the electrodes and duration of electroplating process are the investigated variables. Their effect on the coating thickness and uniformity was analyzed and quantified using design of experiment. The nickel deposition was carried out by electroplating in a standard Watt's solution keeping other plating parameters (current: 0.1 Amp, electric potential: 1.0 V, and pH: 3.5) constant. The gap distance between anode and cathode varied at 5, 10, and 15 mm, while the plating time was 10, 20, and 30 minutes. Coating thickness was found to be proportional to the plating time and inversely proportional to the electrode gap distance, while the uniformity tends to improve at a large electrode gap. Empirical models of both coating thickness and uniformity were developed within the ranges of the gap distance and plating time settings, and an optimized solution was determined using these models.
机译:硬质合金上的电镀镍涂层是一种潜在的预处理技术,可用于在金刚石沉积到硬质金属基材上之前提供中间层。电镀镍涂层被期望具有高质量,例如,具有足够的厚度和均匀性。为此,应相应设置电镀参数。在这项研究中,电极之间的间隙距离和电镀过程的持续时间是研究的变量。使用实验设计分析和量化了它们对涂层厚度和均匀性的影响。镍的沉积是通过在标准的Watt溶液中进行电镀而保持的其他电镀参数(电流:0.1?Amp,电势:1.0?V和pH:3.5)保持恒定的。阳极和阴极之间的间隙距离变化为5、10和15 mm,而电镀时间为10、20和30分钟。发现涂层厚度与电镀时间成正比,与电极间隙距离成反比,而均匀性在大的电极间隙下趋于改善。在间隙距离和电镀时间设置的范围内,建立了涂层厚度和均匀性的经验模型,并使用这些模型确定了最佳的解决方案。

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