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Intrinsic stability of ferroelectric and piezoelectric properties of epitaxial PbZr0.45Ti0.55O3 thin films on silicon in relation to grain tilt

机译:硅上外延PbZr0.45Ti0.55O3薄膜的铁电和压电特性的固有稳定性与晶粒倾斜的关系

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摘要

Piezoelectric thin films of PbZr0.45Ti0.55O3 were grown on Si substrates in four different ways, resulting in different crystalline structures, as determined by x-ray analysis. The crystalline structures were different in the spread in tilt angle and the in-plane alignment of the crystal planes between different grains. It is found that the deviations of the ferroelectric polarization loop from that of the ideal rectangular loop (reduction of the remanent polarization with respect to the saturation polarization, dielectric constant of the film, slanting of the loop, coercive field value) all scale with the average tilt angle. A model is derived based on the assumption that the tilted grain boundaries between grains affect the film properties locally. This model describes the observed trends. The effective piezoelectric coefficient d33,eff shows also a weak dependence on the average tilt angle for films grown in a single layer, whereas it is strongly reduced for the films deposited in multiple layers. The least affected properties are obtained for the most epitaxial films, i.e. grown on a SrTiO3 epitaxial seed layer, by pulsed laser deposition. These films are intrinsically stable and do not require poling to acquire these stable properties.
机译:通过X射线分析确定,PbZr0.45Ti0.55O3的压电薄膜以四种不同的方式在Si衬底上生长,从而导致不同的晶体结构。晶体结构在倾斜角的扩展和不同晶粒之间的晶体平面的面内排列方面不同。发现铁电极化回路与理想矩形回路的偏差(剩余极化相对于饱和极化的减小,膜的介电常数,回路的倾斜,矫顽场值)都随比例变化。平均倾斜角。基于以下假设得出模型:晶粒之间倾斜的晶界会局部影响薄膜性能。该模型描述了观察到的趋势。有效压电系数d33,eff对单层生长的薄膜的平均倾斜角也显示出较弱的依赖性,而对于多层沉积的薄膜,其有效倾角大大降低。对于最外延的膜,即通过脉冲激光沉积在SrTiO3外延种子层上生长的膜,获得的影响最小。这些薄膜本质上是稳定的,不需要极化即可获得这些稳定的性能。

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