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Photoelectrochemical Behavior of Electrophoretically Deposited Hematite Thin Films Modified with Ti(IV)

机译:Ti(IV)修饰的电泳沉积赤铁矿薄膜的光电化学行为

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摘要

Doping hematite with different elements is a common strategy to improve the electrocatalytic activity towards the water oxidation reaction, although the exact effect of these external agents is not yet clearly understood. Using a feasible electrophoretic procedure, we prepared modified hematite films by introducing in the deposition solution Ti(IV) butoxide. Photoelectrochemical performances of all the modified electrodes were superior to the unmodified one, with a 4-fold increase in the photocurrent at 0.65 V vs. SCE in 0.1 M NaOH (pH 13.3) for the 5% Ti-modified electrode, which was the best performing electrode. Subsequent functionalization with an iron-based catalyst led, at the same potential, to a photocurrent of ca. 1.5 mA·cm−2, one of the highest achieved with materials based on solution processing in the absence of precious elements. AFM, XPS, TEM and XANES analyses revealed the formation of different Ti(IV) oxide phases on the hematite surface, that can reduce surface state recombination and enhance hole injection through local surface field effects, as confirmed by electrochemical impedance analysis.
机译:用赤铁矿掺杂不同元素是提高对水氧化反应的电催化活性的常用策略,尽管这些外在试剂的确切作用尚不清楚。使用可行的电泳程序,我们通过在沉积溶液中引入丁氧化钛(IV)来制备改性赤铁矿薄膜。所有改性电极的光电化学性能均优于未改性电极,在5%Ti改性电极中,在0.1M NaOH(pH 13.3)中,SCE在0.65 V时的光电流比SCE增加了4倍。电极。随后用铁基催化剂进行的功能化在相同电势下导致大约1的光电流。 1.5 mA·cm −2 ,这是在不存在贵重元素的情况下,基于固溶处理的材料所能达到的最高值之​​一。 AFM,XPS,TEM和XANES分析表明,赤铁矿表面上形成了不同的Ti(IV)氧化物相,这可以减少表面态复合并通过局部表面场效应增强空穴注入,这一点已通过电化学阻抗分析证实。

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