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Recording Characteristics Microstructure and Crystallization Kinetics of Ge/GeCu Recording Film Used for Write-Once Blu-Ray Disc

机译:用于一次写入蓝光光盘的Ge / GeCu记录膜的记录特性微观结构和结晶动力学

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摘要

A Ge67Cu33 (16 nm) layer and a Ge (3 nm)/Ge67Cu33 (16 nm) bilayer were grown by sputtering at room temperature and used as the recording films for write-once blue laser media. In comparison to the crystallization temperature of Ge in a GeCu film (380.7 °C–405.1 °C), the crystallization temperature of Ge in a Ge/GeCu bilayer could be further decreased to 333.7 °C–382.8 °C. The activation energies of Ge crystallization were 3.51 eV ± 0.05 eV and 1.50 eV ± 0.04 eV for the GeCu and the Ge/GeCu films, respectively, indicating that the Ge/GeCu bilayer possesses a higher feasibility in high-speed optical recording applications. Moreover, the lower activation energy would lead to a larger grain size of Ge crystallization in the Ge/GeCu bilayer after the annealing process. Between the as-deposited and the annealed states, the optical contrasts (@ 405 nm) of the GeCu and the Ge/GeCu films were 26.0% and 47.5%, respectively. This reveals that the Ge/GeCu bilayer is more suitable for the recording film of a write-once blu-ray disc (BD-R) in comparison with the GeCu film. Based on the dynamic tests performed for 2× and 4× recording speeds, the optimum jitter values of the BD-R with the Ge/GeCu recording film were 7.4% at 6.3 mW and 7.6% at 8.6 mW, respectively.
机译:在室温下通过溅射生长Ge67Cu33(16 nm)层和Ge(3 nm)/ Ge67Cu33(16 nm)双层,并将其用作一次写入蓝色激光介质的记录膜。与GeCu薄膜中Ge的结晶温度(380.7°C–405.1°C)相比,Ge / GeCu双层中Ge的结晶温度可以进一步降低至333.7°C–382.8°C。对于GeCu和Ge / GeCu膜,Ge结晶的活化能分别为3.51eV±0.05eV和1.50eV±0.04eV,表明Ge / GeCu双层在高速光学记录应用中具有更高的可行性。而且,较低的活化能将导致退火工艺之后在Ge / GeCu双层中的更大的Ge结晶晶粒尺寸。在沉积态和退火态之间,GeCu和Ge / GeCu薄膜的光学对比度(@ 405 nm)分别为26.0%和47.5%。这表明与GeCu膜相比,Ge / GeCu双层更适合于一次写入蓝光盘(BD-R)的记录膜。根据对2倍和4倍记录速度进行的动态测试,带有Ge / GeCu记录膜的BD-R的最佳抖动值分别为6.3 mW时的7.4%和8.6 mW时的7.6%。

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